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1.发明授权Systems and methods for using non-contact voltage sensors and corona discharge guns 失效使用非接触式电压传感器和电晕放电枪的系统和方法公开(公告)号：US06909291B1
公开(公告)日：2005-06-21
申请号：US10606066
申请日：2003-06-24
CPC分类号： G01N27/002
摘要： A method and a system for calibrating the work function of a non-contact voltage sensor are provided. The method includes preparing a reference sample to have a stable work function, measuring a voltage of the sample using a non-contact voltage sensor, and determining a work function correction factor of the sensor from the measured voltage. In turn, the calibrated work function may be used to adjust voltages of substrates measured by the sensor. A corona gun which includes a first electrode and one or more conductive rods is provided. In some embodiments, the conductive rods may be angled between 0 and 90 degrees with respect to a first electrode sidewall and/or be concentrically arranged less than 90 degrees from each other. In addition or alternatively, the corona gun may be adapted to alter its length and/or include a second electrode partially inset within a space surrounded by the first electrode.
摘要翻译： 提供了一种用于校准非接触式电压传感器的功能的方法和系统。 该方法包括制备参考样品以具有稳定的功函数，使用非接触电压传感器测量样品的电压，以及根据测量的电压确定传感器的功函数校正因子。 反过来，校准的功函数可以用于调节由传感器测量的衬底的电压。 提供包括第一电极和一个或多个导电棒的电晕枪。 在一些实施例中，导电棒相对于第一电极侧壁可以在0度和90度之间成角度和/或彼此同心布置成小于90度。 另外或替代地，电晕枪可以适于改变其长度和/或包括在由第一电极包围的空间内部分插入的第二电极。
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2.发明授权Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer 有权用于控制在晶片上沉积电荷以测量晶片的一个或多个电性能的系统和方法公开(公告)号：US07893703B2
公开(公告)日：2011-02-22
申请号：US11465893
申请日：2006-08-21
申请人： Jeffrey A. Rzepiela , Yiping Feng , Shiyou Pei , Alexander Kagan , Jianou Shi , Sergio Edelstein
发明人： Jeffrey A. Rzepiela , Yiping Feng , Shiyou Pei , Alexander Kagan , Jianou Shi , Sergio Edelstein
IPC分类号： G01R31/308
CPC分类号： G01R31/2831 , G01R31/2856 , H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer are provided. One system includes a corona source configured to deposit the charge on the wafer and a sensor configured to measure one or more conditions within the corona source. This system also includes a control subsystem configured to alter one or more parameters of the corona source based on the one or more conditions. Another system includes a corona source configured to deposit the charge on the wafer and a mixture of gases disposed within a discharge chamber of the corona source during the deposition of the charge. The mixture of gases alters one or more parameters of the charge deposited on the wafer.
摘要翻译： 提供了用于控制晶片上的电荷沉积以测量晶片的一个或多个电性能的系统和方法。 一个系统包括配置成将电荷沉积在晶片上的电晕源和配置成测量电晕源内的一个或多个条件的传感器。 该系统还包括配置为基于一个或多个条件来改变电晕源的一个或多个参数的控制子系统。 另一种系统包括电晕源，其被配置为在电荷沉积期间将电荷沉积在晶片上以及布置在电晕源的放电室内的气体混合物。 气体混合物改变沉积在晶片上的电荷的一个或多个参数。
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3.发明授权Systems and methods for using non-contact voltage sensors and corona discharge guns 有权使用非接触式电压传感器和电晕放电枪的系统和方法公开(公告)号：US07110238B1
公开(公告)日：2006-09-19
申请号：US11154991
申请日：2005-06-16
IPC分类号： H01H47/00
CPC分类号： G01N27/002
摘要： A method and a system for calibrating the work function of a non-contact voltage sensor are provided. The method includes preparing a reference sample to have a stable work function, measuring a voltage of the sample using a non-contact voltage sensor, and determining a work function correction factor of the sensor from the measured voltage. In turn, the calibrated work function may be used to adjust voltages of substrates measured by the sensor. A corona gun which includes a first electrode and one or more conductive rods is provided. In some embodiments, the conductive rods may be angled between 0 and 90 degrees with respect to a first electrode sidewall and/or be concentrically arranged less than 90 degrees from each other. In addition or alternatively, the corona gun may be adapted to alter its length and/or include a second electrode partially inset within a space surrounded by the first electrode.
摘要翻译： 提供了一种用于校准非接触式电压传感器的功能的方法和系统。 该方法包括制备参考样品以具有稳定的功函数，使用非接触电压传感器测量样品的电压，以及根据测量的电压确定传感器的功函数校正因子。 反过来，校准的功函数可以用于调节由传感器测量的衬底的电压。 提供包括第一电极和一个或多个导电棒的电晕枪。 在一些实施例中，导电棒相对于第一电极侧壁可以在0度和90度之间成角度和/或彼此同心布置成小于90度。 另外或替代地，电晕枪可以适于改变其长度和/或包括在由第一电极包围的空间内部分插入的第二电极。
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