IN-SITU ION SOURCE CLEANING FOR PARTIAL PRESSURE ANALYZERS USED IN PROCESS MONITORING
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    发明申请
    IN-SITU ION SOURCE CLEANING FOR PARTIAL PRESSURE ANALYZERS USED IN PROCESS MONITORING 审中-公开
    在过程监控中使用的部分压力分析仪的现场离子源清洁

    公开(公告)号:US20090014644A1

    公开(公告)日:2009-01-15

    申请号:US12170810

    申请日:2008-07-10

    IPC分类号: B01D59/44

    CPC分类号: H01J49/145

    摘要: An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.

    摘要翻译: 一种用于分压分析仪的离子源装置及其基于在离子源内引入空心阴极放电(HCD)的原位清洗方法。 通过向离子源的一个或多个部分施加高负电压而形成HCD,所述离子源包括阳极电极,透镜聚焦板以及至少一个其它透镜或其它形式的板,例如总压力集电板。