公开(公告)号：US08585391B2

公开(公告)日：2013-11-19

申请号：US13238805

申请日：2011-09-21

申请人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

发明人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

IPC分类号： G03F1/82 ,  G03F1/62

CPC分类号： G03F1/64 ,  B08B7/0042 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/142 ,  B23K26/352 ,  B23K26/361 ,  B23K2103/56 ,  G03F1/82

摘要： A photomask cleaning apparatus includes a photomask receiving stage and a laser supply unit. The photomask receiving stage is configured to receive and retain a photomask in a desired orientation. The photomask has a front face having a pellicle adhesive residue region thereon. The desired orientation is with the front face positioned to allow gravity to move particles on the front face away from the front face without interference from the front face of the photomask. The laser supply unit is configured to generate a laser beam that irradiates a target region on the front face of the photomask to remove a pellicle adhesive residue from the target region. The photomask cleaning apparatus is configured to move the target region on the front face of the photomask to irradiate the entire pellicle adhesive residue region. Methods of using the photomask cleaning apparatus are also provided.

摘要翻译： 光掩模清洁装置包括光掩模接收台和激光供给单元。 光掩模接收台被配置为以期望的方向接收和保持光掩模。 光掩模具有在其上具有防护薄膜粘合剂残留区域的前表面。 期望的取向是将前表面定位成允许重力将前表面上的颗粒移动远离前表面，而不会受到光掩模前表面的干扰。 激光供给单元被配置为产生照射光掩模的前表面上的目标区域以从目标区域去除防护薄膜组合物残留物的激光束。 光掩模清洁装置被配置为移动光掩模的前表面上的目标区域以照射整个防粘膜残留区域。 还提供了使用光掩模清洁装置的方法。

公开(公告)号：US20120219654A1

公开(公告)日：2012-08-30

申请号：US13238805

申请日：2011-09-21

申请人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

发明人： Jin-Ho Kim ,  Yo-Han Ahn ,  Jeong-In Yoon ,  Ji-Young Kim

IPC分类号： B28B17/02

CPC分类号： G03F1/64 ,  B08B7/0042 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/142 ,  B23K26/352 ,  B23K26/361 ,  B23K2103/56 ,  G03F1/82

摘要： A photomask cleaning apparatus includes a photomask receiving stage and a laser supply unit. The photomask receiving stage is configured to receive and retain a photomask in a desired orientation. The photomask has a front face having a pellicle adhesive residue region thereon. The desired orientation is with the front face positioned to allow gravity to move particles on the front face away from the front face without interference from the front face of the photomask. The laser supply unit is configured to generate a laser beam that irradiates a target region on the front face of the photomask to remove a pellicle adhesive residue from the target region. The photomask cleaning apparatus is configured to move the target region on the front face of the photomask to irradiate the entire pellicle adhesive residue region. Methods of using the photomask cleaning apparatus are also provided.

摘要翻译： 光掩模清洁装置包括光掩模接收台和激光供给单元。 光掩模接收台被配置为以期望的方向接收和保持光掩模。 光掩模具有在其上具有防护薄膜粘合剂残留区域的前表面。 期望的取向是将前表面定位成允许重力将前表面上的颗粒移动远离前表面，而不会受到光掩模前表面的干扰。 激光供给单元被配置为产生照射光掩模的前表面上的目标区域以从目标区域去除防护薄膜组合物残留物的激光束。 光掩模清洁装置被配置为移动光掩模的前表面上的目标区域以照射整个防粘膜残留区域。 还提供了使用光掩模清洁装置的方法。