公开(公告)号：US06522387B2

公开(公告)日：2003-02-18

申请号：US09761837

申请日：2001-01-18

申请人： Johannes C Mulkens

发明人： Johannes C Mulkens

IPC分类号： G03B2768

CPC分类号： G03F7/70058 ,  G03F7/70066 ,  G03F7/70191

摘要： A microlithography projection apparatus comprises an illuminator, for supplying a beam of radiation for illuminating a pattern on a mask, and a projection system for forming an image of the illuminated portion of the mask on a resist-coated substrate. The image is projected off-axis with respect to the optical axis of the projection system and the aperture of the illuminator is minimized to that of the illuminated portion of the mask. The illuminator is provided with a compensator, such as a tiltable mirror or wedge-like transmissive optical element for compensating for telecentricity errors intrinsic to the projection system.

摘要翻译： 微光刻投影装置包括用于提供用于照射掩模上的图案的辐射束的照明器，以及用于在抗蚀剂涂覆的基底上形成掩模的照射部分的图像的投影系统。 图像相对于投影系统的光轴离轴突出，并且照明器的孔径被最小化到掩模的照射部分的孔径。 照明器设置有补偿器，例如用于补偿投影系统固有的远心错误的可倾斜镜或楔形透射光学元件。

公开(公告)号：US06473163B2

公开(公告)日：2002-10-29

申请号：US09726480

申请日：2000-12-01

申请人： Johannes C Mulkens ,  Paul Van der Veen

发明人： Johannes C Mulkens ,  Paul Van der Veen

IPC分类号： G03B2754

CPC分类号： G03F7/70216

摘要： The filter has alternating layers of relatively high and relatively low refractive index media. The layers are formed as a coating on an optical component in the projection lens system of a lithographic projection apparatus. The filter transmits radiation at a wavelength of 157 nm for exposing an image of a mask pattern on a resist-coated substrate while attenuating radiation resulting from fluorescence in optical components of the lithographic projection apparatus, caused by the imaging radiation, and which if not attenuated would reduce the contrast of the image exposed in the resist.

摘要翻译： 滤光片具有相对较高和相对低折射率介质的交替层。 这些层形成为光刻投影装置的投影透镜系统中的光学部件上的涂层。 滤光器透射波长为157nm的辐射，用于在抗蚀剂涂覆的基板上曝光掩模图案的图像，同时衰减由成像辐射引起的光刻投影设备的光学部件中的荧光产生的辐射，如果不被衰减 将降低在抗蚀剂中暴露的图像的对比度。