公开(公告)号：US06721033B1

公开(公告)日：2004-04-13

申请号：US09615461

申请日：2000-07-13

申请人： Kenichirou Kaneko

发明人： Kenichirou Kaneko

IPC分类号： G03B2768

CPC分类号： G03F7/70425 ,  G03B27/32 ,  G03F7/70358

摘要： A photolithography exposure apparatus exposes a substrate to a pattern image formed on a mask to transfer the pattern onto the substrate. The apparatus includes a substrate stage on which the substrate is mounted. The substrate stage together with the substrate is movable when the substrate is being exposed to the pattern image. A memory stores pattern image distortion information generated in accordance with an exposure position on the substrate when the pattern image is being transferred onto the substrate. A compensator compensates for the distortion so that the pattern is formed cleanly on the substrate.

摘要翻译： 光刻曝光设备将衬底暴露于形成在掩模上的图案图像，以将图案转印到衬底上。 该装置包括其上安装有基板的基板台。 当衬底暴露于图案图像时，衬底台与衬底一起可移动。 当图案图像被转印到基板上时，存储器存储根据基板上的曝光位置生成的图案图像失真信息。 补偿器补偿变形，使得图案在基板上形成干净。

公开(公告)号：US06542219B2

公开(公告)日：2003-04-01

申请号：US10097379

申请日：2002-03-15

申请人： Josephus J. M. Braat ,  Cornelis J. van der Laan

发明人： Josephus J. M. Braat ,  Cornelis J. van der Laan

IPC分类号： G03B2768

CPC分类号： G03F7/70308

摘要： A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.

公开(公告)号：US06373552B1

公开(公告)日：2002-04-16

申请号：US09484200

申请日：2000-01-18

申请人： Josephus J. M. Braat ,  Cornelis J. van der Laan

发明人： Josephus J. M. Braat ,  Cornelis J. van der Laan

IPC分类号： G03B2768

CPC分类号： G03F7/70308

摘要： A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.

摘要翻译： 使用具有基本恒定厚度的板来补偿由用于光刻的高质量投影透镜投射的图像中的残余变形。 板的两个表面具有相同的非球面轮廓，其形状已经使用光刻物镜的测量失真图进行了计算。 应用于板的成形工艺在弹性变形的存在下使用抛光原理，以便在两侧实现期望的非球面形状。

公开(公告)号：US06646714B2

公开(公告)日：2003-11-11

申请号：US09954035

申请日：2001-09-18

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B2768

CPC分类号： G03F7/70483 ,  G03B27/68

摘要： An exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage. The apparatus includes a mark placed on the movable stage and imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section, wherein the mark is imaged on the image reception section, using light of an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by the image reception section.

摘要翻译： 一种曝光装置，用于通过投影光学系统将形成在母板上的转印图案投影和曝光到放置在可移动台上的基板上。 该装置包括放置在可移动台上的标记，并且基于入射位置对入射光施加相位差，然后使用光的图像输出光，图像接收部，其中标记被成像在图像接收部上 通过投影光学系统的曝光波长，以及数据处理部，其基于由图像接收部获得的图像数据来计算投影光学系统的成像性能。

公开(公告)号：US06580491B2

公开(公告)日：2003-06-17

申请号：US09749044

申请日：2000-12-26

申请人： Richard Ronald Hall ,  Robert Lee Lewis ,  How Tzu Lin ,  Peter Michael Nichols ,  Robert David Sebesta

发明人： Richard Ronald Hall ,  Robert Lee Lewis ,  How Tzu Lin ,  Peter Michael Nichols ,  Robert David Sebesta

IPC分类号： G03B2768

CPC分类号： G03F7/70466 ,  G03F7/70258 ,  G03F9/00 ,  H05K1/0269 ,  H05K3/0008 ,  H05K3/0082 ,  H05K2201/09918

摘要： Apparatus and method for compensating for distortion of the substrate of a printed circuit workpiece that involves performing two tasks. First, a mask that carries functional circuit features and alignment features is positioned rotatably so that the mask alignment features, when projected onto a table that holds the printed circuit workpiece, will be on a line extending parallel to one of two orthogonal axes of the table. Second, the spacing of alignment features on the printed circuit workpiece is determined and this determination is a measure of the distortion of the printed circuit workpiece substrate. A lens through which the mask image is projected is moved to adjust the magnification of the image in accordance with the measured distortion of the substrate of the printed circuit workpiece.

公开(公告)号：US06522387B2

公开(公告)日：2003-02-18

申请号：US09761837

申请日：2001-01-18

申请人： Johannes C Mulkens

发明人： Johannes C Mulkens

IPC分类号： G03B2768

CPC分类号： G03F7/70058 ,  G03F7/70066 ,  G03F7/70191

摘要： A microlithography projection apparatus comprises an illuminator, for supplying a beam of radiation for illuminating a pattern on a mask, and a projection system for forming an image of the illuminated portion of the mask on a resist-coated substrate. The image is projected off-axis with respect to the optical axis of the projection system and the aperture of the illuminator is minimized to that of the illuminated portion of the mask. The illuminator is provided with a compensator, such as a tiltable mirror or wedge-like transmissive optical element for compensating for telecentricity errors intrinsic to the projection system.

摘要翻译： 微光刻投影装置包括用于提供用于照射掩模上的图案的辐射束的照明器，以及用于在抗蚀剂涂覆的基底上形成掩模的照射部分的图像的投影系统。 图像相对于投影系统的光轴离轴突出，并且照明器的孔径被最小化到掩模的照射部分的孔径。 照明器设置有补偿器，例如用于补偿投影系统固有的远心错误的可倾斜镜或楔形透射光学元件。

公开(公告)号：US06480259B1

公开(公告)日：2002-11-12

申请号：US09675327

申请日：2000-09-28

申请人： Victor C. Wong ,  Badhri Narayan ,  Dan S. Talbot

发明人： Victor C. Wong ,  Badhri Narayan ,  Dan S. Talbot

IPC分类号： G03B2768

CPC分类号： G03B27/72

摘要： A monochrome printer (100) and a method for printer optics design utilizing a spatial light modulator (52), able to deploy a number of possible monochromatic light sources for use with a number of different types of photosensitive media (160), are disclosed. The printer provides high resolution and grayscale imaging capability for monochromatic applications such as micrographics and for diagnostic imaging. In the apparatus and method, illumination optics (11) receive a source light beam, from one or more LEDs or from a number of other possible monochromatic light sources available on the printer (100), uniformize and polarize the beam, and direct the beam through a polarization beamsplitter element (50). The polarization beamsplitter element (50) directs one polarization state of light to an LCD spatial light modulator (52). The LCD spatial light modulator (52) modulates the polarization of the polarized beam to provide output exposure energy suitable for image marking on dry or aqueous photosensitive media (160). An optional sensor (234) allows printer (100) to automatically select a monochromatic light source of appropriate wavelength for a given type of photosensitive media (160).

摘要翻译： 公开了一种单色打印机（100）和利用空间光调制器（52）的打印机光学设计的方法，所述空间光调制器能够部署用于许多不同类型的感光介质（160）的许多可能的单色光源。 打印机为单色应用（如微图像和诊断成像）提供高分辨率和灰度成像功能。 在装置和方法中，照明光学器件（11）从一个或多个LED或从打印机（100）上可用的多个其它可能的单色光源接收源光束，使光束均匀化和极化，并且将光束 通过偏振分束器元件（50）。 偏振分束器元件（50）将一种偏振态的光引导到LCD空间光调制器（52）。 LCD空间光调制器（52）调制偏振光束的偏振，以提供适合于在干性或水性感光介质上的图像标记的输出曝光能量（160）。 可选的传感器（234）允许打印机（100）为给定类型的光敏介质（160）自动选择适当波长的单色光源。

公开(公告)号：US06295118B1

公开(公告)日：2001-09-25

申请号：US08959304

申请日：1997-10-28

申请人： Seiji Takeuchi

发明人： Seiji Takeuchi

IPC分类号： G03B2768

CPC分类号： G03F7/70858 ,  G02B5/1866 ,  G03F7/70883

摘要： An optical arrangement includes a diffractive optical element and a curvature control system for changing curvature of the diffractive optical element. The optical arrangement can be incorporated into an exposure apparatus having an illuminating system for illuminating a mask having a pattern formed thereon and a projecting system for projecting the pattern of the mask onto a wafer, such that the projecting system includes a diffractive optical element and a curvature control system for changing curvature of the diffractive optical element.

摘要翻译： 光学装置包括衍射光学元件和用于改变衍射光学元件的曲率的曲率控制系统。 光学装置可以结合到具有用于照射其上形成有图案的掩模的照明系统的曝光装置和用于将掩模的图案投影到晶片上的投影系统，使得投影系统包括衍射光学元件和 用于改变衍射光学元件的曲率的曲率控制系统。

公开(公告)号：US06201598B1

公开(公告)日：2001-03-13

申请号：US09298646

申请日：1999-04-23

申请人： Osamu Arai

发明人： Osamu Arai

IPC分类号： G03B2768

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0453 ,  H01J2237/31794

摘要： Charged-particle-beam (CPB) microlithographic exposure apparatus and reticles for use therewith. The reticle defines a pattern corresponding to a die pattern to be imprinted on the wafer. The pattern on the reticle is divided into multiple subregions separated from each other by light-shielding boundary zones. Multiple reticle subregions are have so as to include a center portion and a peripheral portion. As such reticle subregions are projected onto the substrate, the peripheral portions of adjacent subregions as projected onto the wafer overlap each other.

摘要翻译： 带电粒子束（CPB）微光刻曝光装置和与其一起使用的掩模版。 掩模版定义对应于要印在晶片上的管芯图案的图案。 掩模版上的图案被光屏蔽边界区域分隔成多个子区域。 多个掩模版子区域具有中心部分和周边部分。 由于这样的标线片子区域投影到基板上，所以投影到晶片上的相邻子区域的外围部分彼此重叠。

公开(公告)号：US06750947B1

公开(公告)日：2004-06-15

申请号：US09590182

申请日：2000-06-09

申请人： Hiroyuki Tomita ,  Ryuichi Ebinuma ,  Makoto Mizuno

发明人： Hiroyuki Tomita ,  Ryuichi Ebinuma ,  Makoto Mizuno

IPC分类号： G03B2768

CPC分类号： G03F7/70825 ,  G02B7/026 ,  G02B15/14

摘要： A driving device includes a first member, an annular second member arranged outside the first member, an annular first plate for connecting the first and second members to each other, and an annular second plate for connecting the first and second members to each other. The first and second members are moved relative to each other by supplying or exhausting a fluid into or from a space surrounded by the first and second members and the first and second plates. Also, at least one of (i) an inner diameter a1 of a portion of the second member at which the second member is connected to the first plate is different from an inner diameter a2 of a portion of the second member at which the second member is connected to the second plate and (ii) an outer diameter b1 of a portion of the first member at which the first member is connected to the first plate is different from an outer diameter b2 of a portion of the first member at which the first member is connected to the second plate.

摘要翻译： 驱动装置包括第一构件，布置在第一构件外部的环形第二构件，用于将第一构件和第二构件彼此连接的环形第一板和用于将第一构件和第二构件彼此连接的环形第二板。 通过向第一和第二构件以及第一和第二板围绕的空间供应或排出流体，第一和第二构件相对于彼此移动。 此外，（i）第二构件的与第一板连接的部分的内径a1中的至少一个与第二构件的第二构件的一部分的内径a2不同， 连接到第二板，并且（ii）第一构件与第一板连接的部分的外径b1不同于第一构件的第一构件的第一构件的一部分的外径b2 构件连接到第二板。