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公开(公告)号:US07448017B2
公开(公告)日:2008-11-04
申请号:US11763808
申请日:2007-06-15
申请人: Howard T. Barrett , Pierre J. Bouchard , James B. Clairmont , Karen S. Edwards , Maureen F. McFadden , John F. Rudden, Jr. , Florence Marie St. Pierre Sears , Jeffrey C. Stamm
发明人: Howard T. Barrett , Pierre J. Bouchard , James B. Clairmont , Karen S. Edwards , Maureen F. McFadden , John F. Rudden, Jr. , Florence Marie St. Pierre Sears , Jeffrey C. Stamm
CPC分类号: G06F17/5068
摘要: A method and system is provided to use the same design manipulation processes for both chip design and kerf design. Concurrent generation of kerf designs and chip designs provides a consistent, accurate, and repeatable process. Improved quality of wafer testing results because the data in the kerf matches data in the chip. The total cycle time for mask manufacturing is reduced because kerf build is accomplished prior to start of the mask manufacturing process. Also provided is the use of load balancing across multiple servers during kerf and chip design to optimize computing resources.
摘要翻译: 提供了一种方法和系统,以对芯片设计和切角设计采用相同的设计操作过程。 并口生成切口设计和芯片设计提供了一致,准确和可重复的过程。 由于切片中的数据与芯片中的数据匹配,因此提高了晶圆测试的质量。 掩模制造的总循环时间减少,因为在开始掩模制造过程之前完成切口构造。 还提供了在切割和芯片设计期间跨多个服务器的负载平衡的使用,以优化计算资源。
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公开(公告)号:US07275234B2
公开(公告)日:2007-09-25
申请号:US10605109
申请日:2003-09-09
申请人: Howard T. Barrett , Pierre J. Bouchard , James B. Clairmont , Karen S. Edwards , Maureen F. McFadden , John F. Rudden, Jr. , Florence Marie St. Pierre Sears , Jeffrey C. Stamm
发明人: Howard T. Barrett , Pierre J. Bouchard , James B. Clairmont , Karen S. Edwards , Maureen F. McFadden , John F. Rudden, Jr. , Florence Marie St. Pierre Sears , Jeffrey C. Stamm
CPC分类号: G06F17/5068
摘要: A method and system is provided to use the same design manipulation processes for both chip design and kerf design. Concurrent generation of kerf designs and chip designs provides a consistent, accurate, and repeatable process. Improved quality of wafer testing results because the data in the kerf matches data in the chip. The total cycle time for mask manufacturing is reduced because kerf build is accomplished prior to start of the mask manufacturing process. Also provided is the use of load balancing across multiple servers during kerf and chip design to optimize computing resources.
摘要翻译: 提供了一种方法和系统,以对芯片设计和切角设计采用相同的设计操作过程。 并口生成切口设计和芯片设计提供了一致,准确和可重复的过程。 由于切片中的数据与芯片中的数据匹配,因此提高了晶圆测试的质量。 掩模制造的总循环时间减少,因为在开始掩模制造过程之前完成切口构造。 还提供了在切割和芯片设计期间跨多个服务器的负载平衡的使用,以优化计算资源。
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