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    Production of materials having an anisotropic structure
    2.
    发明授权
    Production of materials having an anisotropic structure 有权

    公开(公告)号：US10576694B2

    公开(公告)日：2020-03-03

    申请号：US15498286

    申请日：2017-04-26

    申请人： Julius-Maximilians-Universitaet Wuerzburg

    发明人： Kai Stuckensen ,  Uwe Gbureck ,  Juergen Groll

    IPC分类号： B29C67/20 ,  A61L27/24 ,  A61F2/30 ,  A61L27/56

    摘要： The present invention relates to a monolithic multi-layered material having at least a first layer, from which anisotropic pores originate, and a second layer, in which the anisotropic pores continue. The present invention further relates to a monolithic medical material having at least a first layer, from which anisotropic pores originate, and a second layer, in which the anisotropic pores continue. The present invention further relates to a process for the production of a multi-layered material having anisotropic pores. It further relates to a multi-layered material which can be produced by the process according to the invention.

    PRODUCTION OF MATERIALS HAVING AN ANISOTROPIC STRUCTURE
    5.
    发明申请
    PRODUCTION OF MATERIALS HAVING AN ANISOTROPIC STRUCTURE 审中-公开

    公开(公告)号：US20170224459A1

    公开(公告)日：2017-08-10

    申请号：US15498286

    申请日：2017-04-26

    申请人： Julius-Maximilians-Universitaet Wuerzburg

    发明人： Kai Stuckensen ,  Uwe Gbureck ,  Juergen Groll

    IPC分类号： A61F2/00 ,  A61L27/56 ,  A61L27/24 ,  A61F2/30

    摘要： The present invention relates to a monolithic multi-layered material having at least a first layer, from which anisotropic pores originate, and a second layer, in which the anisotropic pores continue. The present invention further relates to a monolithic medical material having at least a first layer, from which anisotropic pores originate, and a second layer, in which the anisotropic pores continue. The present invention further relates to a process for the production of a multi-layered material having anisotropic pores. It further relates to a multi-layered material which can be produced by the process according to the invention.

    COMPOUND CONTAINING DEXPANTHENOL
    8.
    发明申请
    COMPOUND CONTAINING DEXPANTHENOL 审中-公开

    公开(公告)号：US20190031699A1

    公开(公告)日：2019-01-31

    申请号：US16148107

    申请日：2018-10-01

    申请人： JULIUS-MAXIMILIANS-UNIVERSITAET WUERZBURG

    发明人： JUERGEN SEIBEL ,  MALTE TIMM

    IPC分类号： C07H15/04 ,  A61K8/67 ,  A61Q19/00

    摘要： A compound contains a chemical dexpanthenol bound to a saccharide. A corresponding compound for use in therapeutic and/or cosmetic methods is also provided. The compound may be a skincare compound or a compound configured to be used in prophylaxis of skin diseases and/or treatment of skin diseases or a compound configured to be used as a medicament for accelerating wound healing.

    PROTEOLYSIS TARGETING CHIMERA (PROTAC) FOR DEGRADATION OF AURORA A-KINASE
    10.
    发明申请
    PROTEOLYSIS TARGETING CHIMERA (PROTAC) FOR DEGRADATION OF AURORA A-KINASE 有权

    公开(公告)号：US20230118911A1

    公开(公告)日：2023-04-20

    申请号：US17906184

    申请日：2021-03-10

    申请人： Julius-Maximilians-Universitaet Wuerzburg

    发明人： Elmar WOLF ,  Martin EILERS

    IPC分类号： A61K47/55 ,  A61K47/54 ,  A61P35/00

    摘要： The invention concerns a Proteolysis Targeting Chimera (PROTAC) or a pharmaceutically acceptable salt thereof for degradation of Aurora A-kinase in cells of a mammal which PROTAC has the chemical structure AAB-L-E3B, wherein AAB is a binding unit for Aurora A-kinase, L is a linker and E3B is a binding unit for E3-ubiquitin ligase Cereblon, wherein E3B comprises the structure of thalidomide or of one of its analogs lenalidomide, pomalidomide, and apremilast, wherein L comprises or consists of an alkyl ether residue or a polyalkyl ether residue or an alkyl ether residue or a polyalkyl ether residue in which at least one C—C bond is replaced by a C═C double bond, which polyalkyl ether residue has at least two ether groups or at least two ether groups in which one O-atom is replaced by an S-atom or a part of the O-atoms is replaced by S-atoms or wherein L comprises or consists of an alkyl thioether residue or a polyalkyl thioether residue or an alkyl thioether residue or a polyalkyl thioether residue in which at least one C—C bond is replaced by a C═C double bond, which polyalkyl thioether residue has at least two thioether groups, wherein L connects AAB and E3B via a chain of atoms having five to thirteen subsequently arranged atoms, wherein atoms of functional groups connecting the linker with AAB and E3B are not considered as part of said chain.