公开(公告)号：US20110143035A1

公开(公告)日：2011-06-16

申请号：US12961321

申请日：2010-12-06

申请人： Byoung Ha CHO ,  Jung Hwa Seo ,  Tae Hyung Kim ,  Dong Kyun Seo ,  Su Il Jo

发明人： Byoung Ha CHO ,  Jung Hwa Seo ,  Tae Hyung Kim ,  Dong Kyun Seo ,  Su Il Jo

IPC分类号： C23C16/448 ,  C23C16/00

CPC分类号： C23C16/4481

摘要： A thin film deposition system and a method for deposit a thin film are disclosed. A thin film deposition system includes a source material feeder configured to feed source material, a source gas feeder comprising a vaporizer connected with the source material feeder to evaporate the source material fed by the source material feeder, a thin film deposition device connected with the source gas feeder to deposit the evaporated source material fed by the source gas feeder on a treatment object, vaporizer exhaustion unit having an end connected with the vaporizer to ventilate an inside of the vaporizer, and a pressure adjuster connected with the exhaustion tube to adjust the pressure of the exhaustion tube to control the velocity of source material fed to the vaporizer.

摘要翻译： 公开了薄膜沉积系统和沉积薄膜的方法。 一种薄膜沉积系统，包括配置成进料源材料的源材料进料器，源气体进料器，其包括与源材料进料器连接的蒸发器，以蒸发由源材料进料器供料的原料;一个与该源连接的薄膜沉积装置 气体供给器，用于将由源气体供给器供给的蒸发源材料沉积在处理对象上，蒸发器排气单元具有与蒸发器连接的端部以使蒸发器的内部通风;以及压力调节器，与排气管连接以调节压力 以控制供给到蒸发器的源材料的速度。