公开(公告)号：US20100198386A1

公开(公告)日：2010-08-05

申请号：US12760017

申请日：2010-04-14

申请人： Kaname YAMAJI ,  Kiyoshi Suzuki ,  Yuichi Takenaga

发明人： Kaname YAMAJI ,  Kiyoshi Suzuki ,  Yuichi Takenaga

IPC分类号： G05B13/02

CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

公开(公告)号：US07738983B2

公开(公告)日：2010-06-15

申请号：US11905842

申请日：2007-10-04

申请人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

发明人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

IPC分类号： G06F19/00

CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

公开(公告)号：US08082054B2

公开(公告)日：2011-12-20

申请号：US12760017

申请日：2010-04-14

申请人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

发明人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

IPC分类号： G06F19/00

CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

公开(公告)号：US20080086228A1

公开(公告)日：2008-04-10

申请号：US11905842

申请日：2007-10-04

申请人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

发明人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

IPC分类号： G06F19/00

CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。