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    Method of optimizing process recipe of substrate processing system
    1.
    发明授权
    Method of optimizing process recipe of substrate processing system 有权
    基板处理系统工艺配方优化方法

    公开(公告)号：US08082054B2

    公开(公告)日：2011-12-20

    申请号：US12760017

    申请日：2010-04-14

    申请人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    发明人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    IPC分类号： G06F19/00

    CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

    摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

    摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

    Method of optimizing process recipe of substrate processing system
    2.
    发明申请
    Method of optimizing process recipe of substrate processing system 有权
    基板处理系统工艺配方优化方法

    公开(公告)号：US20080086228A1

    公开(公告)日：2008-04-10

    申请号：US11905842

    申请日：2007-10-04

    申请人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    发明人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    IPC分类号： G06F19/00

    CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

    摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

    摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

    METHOD OF OPTIMIZING PROCESS RECIPE OF SUBSTRATE PROCESSING SYSTEM
    3.
    发明申请
    METHOD OF OPTIMIZING PROCESS RECIPE OF SUBSTRATE PROCESSING SYSTEM 有权
    基板加工系统优化方法的方法

    公开(公告)号：US20100198386A1

    公开(公告)日：2010-08-05

    申请号：US12760017

    申请日：2010-04-14

    申请人： Kaname YAMAJI ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    发明人： Kaname YAMAJI ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    IPC分类号： G05B13/02

    CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

    摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

    摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

    Method of optimizing process recipe of substrate processing system
    4.
    发明授权
    Method of optimizing process recipe of substrate processing system 有权
    基板处理系统工艺配方优化方法

    公开(公告)号：US07738983B2

    公开(公告)日：2010-06-15

    申请号：US11905842

    申请日：2007-10-04

    申请人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    发明人： Kaname Yamaji ,  Kiyoshi Suzuki ,  Yuichi Takenaga

    IPC分类号： G06F19/00

    CPC分类号： C23C16/52 ,  G05B13/021 ,  H01L21/67005 ,  H01L22/12 ,  H01L22/20

    摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

    摘要翻译： 本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

    Liquid discharge device and liquid discharge apparatus
    5.
    发明授权
    Liquid discharge device and liquid discharge apparatus 有权

    公开(公告)号：US11999168B2

    公开(公告)日：2024-06-04

    申请号：US17598308

    申请日：2020-04-01

    申请人： Shuusei Murai ,  Kiyoshi Suzuki ,  Tomomi Katoh

    发明人： Shuusei Murai ,  Kiyoshi Suzuki ,  Tomomi Katoh

    IPC分类号： B41J2/165

    CPC分类号： B41J2/16544 ,  B41J2/16552

    摘要： A liquid discharge device includes a liquid discharge head including nozzles configured to discharge a liquid, a carriage mounting the liquid discharge head and movable, a wiper configured to wipe a nozzle surface of the liquid discharge head, and a wiper mover configured to hold and move the wiper between a facing position at which the wiper faces the nozzle surface and a standby position at which the wiper does not face the nozzle surface. The carriage movably holds the liquid discharge head and the wiper mover as a single unit.

    Mobile information terminal and cellular phone
    6.
    发明授权
    Mobile information terminal and cellular phone 有权
    移动信息终端和手机

    公开(公告)号：US08255002B2

    公开(公告)日：2012-08-28

    申请号：US12530965

    申请日：2008-04-02

    申请人： Yasutomo Nakahara ,  Kiyoshi Suzuki

    发明人： Yasutomo Nakahara ,  Kiyoshi Suzuki

    IPC分类号： H04M1/00

    CPC分类号： H04M1/7258 ,  G06F3/044 ,  G06F3/0485 ,  G06F3/04883 ,  G06F3/04886 ,  G06F2203/04106 ,  H04M1/72519 ,  H04M2250/22

    摘要： A mobile information terminal has: an operating position detecting part 37 that detects an operating position of a user on the basis of an output of an electrostatic capacitance sensor 30 that includes a thin film having a plurality of electrodes and detects an electrostatic capacitance of each of the electrodes; a direction input control part 31 that senses movement of the operating position on the basis of an output of the operating position detecting part, and generates a direction input signal; a key input part 32 that detects a pressing operation of the user on a pressing face of an operation key, and generates a key input signal; a display 22 having a display screen; and a display control part 34 that controls a display position of image information in the display screen on the basis of the direction input signal. A part of the thin film of the electrostatic capacitance sensor 30 is formed with overlapping with at least a part of the pressing face of the operation key, and upon sensing of the movement of the operating position, the direction input control part 31 determines whether or not to generate the direction input signal on the basis of an operating position upon start of the movement. Upon operation of the operation key that is arranged with overlapping with an electrostatic pad, a direction input for moving a screen display can be suppressed from being erroneously provided.

    摘要翻译： 移动信息终端具有：操作位置检测部37，其基于包括具有多个电极的薄膜的静电电容传感器30的输出来检测用户的操作位置，并且检测每个的静电电容 电极; 方向输入控制部31，其基于操作位置检测部的输出来感测操作位置的移动，并生成方向输入信号; 按键输入部32，其检测用户在操作键的按压面上的按压操作，并生成键输入信号; 具有显示屏的显示器22; 以及显示控制部34，其根据方向输入信号来控制显示画面中的图像信息的显示位置。 静电电容传感器30的薄膜的一部分形成为与操作键的按压面的至少一部分重叠，并且在感测到操作位置的移动时，方向输入控制部31确定是否 不是在运动开始时基于操作位置生成方向输入信号。 在与静电垫重叠地布置的操作键的操作中，可以抑制用于移动画面显示的方向输入被错误地设置。

    Acid addition salt of carbasugar amine derivative
    9.
    发明授权
    Acid addition salt of carbasugar amine derivative 失效
    碳酰胺衍生物的酸加成盐

    公开(公告)号：US07485755B2

    公开(公告)日：2009-02-03

    申请号：US10557851

    申请日：2004-05-19

    申请人： Kiyoshi Suzuki ,  Masami Iida ,  Yuji Kaneda ,  Naoko Kajimoto ,  Miwa Sawa

    发明人： Kiyoshi Suzuki ,  Masami Iida ,  Yuji Kaneda ,  Naoko Kajimoto ,  Miwa Sawa

    IPC分类号： C07C211/40 ,  A61K31/13

    CPC分类号： C07C215/44

    摘要： An acid addition salt of a carba-sugar amine derivative represented by the following formula (1): wherein R1 and R2 each independently represents a hydrogen atom, or an alkyl group, an alkenyl group, an alkynyl group, an acyl group, an aryl group or an aralkyl group which may have one or at least two of the following substituent (I) or (II), or R1 and R2 are taken together to represent a substituent (III) (R8 to R12 each independently represents an alkyl group, an alkenyl group, an alkynyl group, an acyl group, an aryl group or an aralkyl group), with the proviso that both R1 and R2 are not a hydrogen atom at the same time; R3, R4 and R7 each independently represents a hydroxyl group or a hydroxyl group having a substituent; and R5 and R6 each independently represents a hydrogen atom, or a hydroxyl group or a hydroxyl group having a substituent, with the proviso that when one of R5 and R6 is a hydrogen atom, the other is a hydroxyl group or a hydroxyl group having a substituent.

    摘要翻译： 由下式（1）表示的碳 - 糖胺衍生物的酸加成盐：其中R1和R2各自独立地表示氢原子，或烷基，烯基，炔基，酰基，芳基 基团或可以具有以下取代基（I）或（II）中的一个或至少两个的芳烷基，或者R 1和R 2一起表示取代基（III）（R8〜R12各自独立地表示烷基， 烯基，炔基，酰基，芳基或芳烷基），条件是R 1和R 2同时不是氢原子; R 3，R 4和R 7各自独立地表示羟基或具有取代基的羟基; 并且R 5和R 6各自独立地表示氢原子或具有取代基的羟基或羟基，条件是当R 5和R 6中的一个为氢原子时，另一个为羟基或具有 取代基。