Coated art material system
    1.
    发明申请
    Coated art material system 有权
    涂装艺术材料系统

    公开(公告)号:US20050287356A1

    公开(公告)日:2005-12-29

    申请号:US10880264

    申请日:2004-06-29

    IPC分类号: B32B5/16

    摘要: The present invention is a system for hiding and later revealing a hidden layer. The system includes a substrate and applicator. As the user moves the applicator around the substrate, a coating is rendered transparent to reveal a hidden layer under the pattern of the user's movement of the applicator. The system comprises a substrate at least partially coated with a generally opaque coating that reacts with an eradicator fluid. A preferred coating as applied to the substrate comprises 20-80 wt % water, 0-3 wt % defoamer, 0-3 wt % surfactant, 0-5 wt % wetting agent, 1-25 wt % colorant, 1-60 wt % resin, and 0-4 wt % preservatives. A preferred reducing fluid in such case comprises 30-95 wt % water, 1-5 wt % pH adjuster, 5-15 wt % reducing agent, 0-5 wt % surfactant, and 2-10 wt % buffer.

    摘要翻译: 本发明是一种用于隐藏并随后揭示隐藏层的系统。 该系统包括基底和涂敷器。 当使用者将涂抹器移动到基底周围时,涂层变得透明,以在使用者的涂抹器运动的图案下露出隐藏层。 该系统包括至少部分地涂覆有与消除剂流体反应的通常不透明的涂层的基底。 施加到基材上的优选涂层包括20-80重量%的水,0-3重量%的消泡剂,0-3重量%的表面活性剂,0-5重量%的润湿剂,1-25重量%的着色剂,1-60重量% 树脂和0-4重量%的防腐剂。 在这种情况下,优选的还原流体包括30-95重量%的水,1-5重量%的pH调节剂,5-15重量%的还原剂,0-5重量%的表面活性剂和2-10重量%的缓冲液。

    Coated art material system
    2.
    发明授权
    Coated art material system 有权
    涂装艺术材料系统

    公开(公告)号:US07521112B2

    公开(公告)日:2009-04-21

    申请号:US10880264

    申请日:2004-06-29

    IPC分类号: B32B5/66

    摘要: The present invention is a system for hiding and later revealing a hidden layer. The system includes a substrate and applicator. As the user moves the applicator around the substrate, a coating is rendered transparent to reveal a hidden layer under the pattern of the user's movement of the applicator. The system comprises a substrate at least partially coated with a generally opaque coating that reacts with an eradicator fluid. A preferred coating as applied to the substrate comprises 20-80 wt % water, 0-3 wt % defoamer, 0-3 wt % surfactant, 0-5 wt % wetting agent, 1-25 wt % colorant, 1-60 wt % resin, and 0-4 wt % preservatives. A preferred reducing fluid in such case comprises 30-95 wt % water, 1-5 wt % pH adjuster, 5-15 wt % reducing agent, 0-5 wt % surfactant, and 2-10 wt % buffer.

    摘要翻译: 本发明是一种用于隐藏并随后揭示隐藏层的系统。 该系统包括基底和涂敷器。 当使用者将涂抹器移动到基底周围时,涂层变得透明,以在使用者的涂抹器运动的图案下露出隐藏层。 该系统包括至少部分地涂覆有与消除剂流体反应的通常不透明的涂层的基底。 施加到基材上的优选涂层包括20-80重量%的水,0-3重量%的消泡剂,0-3重量%的表面活性剂,0-5重量%的润湿剂,1-25重量%的着色剂,1-60重量% 树脂和0-4重量%的防腐剂。 在这种情况下,优选的还原流体包括30-95重量%的水,1-5重量%的pH调节剂,5-15重量%的还原剂,0-5重量%的表面活性剂和2-10重量%的缓冲液。