摘要:
The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiO2 particles, and the SiO2 particles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner (1) focuses the media flow toward the plasma zone (4) by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle (7) is designed so that it is focussed toward the plasma zone (4). The focussing is effected by a tapering (6) of the media nozzle (7).
摘要:
In a known method for the production of a blank mold for optical fibers, a fluorine-doped SiO2 enveloping glass is produced on a core glass cylinder that rotates about its longitudinal axis, wherein a silicon-containing starting substance is fed to a plasma burner, said substance is then oxidized in a plasma flame assigned to the plasma burner to obtain SiO2 particles, the SiO2 particles are deposited by layers on the enveloping surface of the cylinder of the core glass cylinder in the presence of fluorine and sintered into the enveloping glass. The invention aims at providing an economical method, which builds upon the above-mentioned method, in order to produce a blank mold from which optical multi-mode fibers (52) can be obtained. In comparison with fibers (51) produced according to standard methods, said optical multi-mode fibers are characterized by high initial transmission in the UV wavelength range and good resistance with respect to brief UV radiation, more particularly in the 210-300 nm wavelength range. According to the invention, a plasma flame that irradiates an ultraviolet light having a wavelength of 214 nm with an intensity of at least 0.9 ?W—determined on the basis of plasma flame intensity measurement—is used for the formation and deposition of the SiO2 particles on the core glass.