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    TITANIA-SILICA GLASS WITH UNIFORM HYDROXYL CONCENTRATION
    1.
    发明公开
    TITANIA-SILICA GLASS WITH UNIFORM HYDROXYL CONCENTRATION 审中-公开

    公开(公告)号：US20240246850A1

    公开(公告)日：2024-07-25

    申请号：US18411231

    申请日：2024-01-12

    申请人： CORNING INCORPORATED

    发明人： Michael John Campion ,  Sergey Nikolaevich Shubin ,  Pushkar Tandon

    IPC分类号： C03B19/14

    CPC分类号： C03B19/1453 ,  C03B2201/075

    摘要： A process of forming a titania-silica glass body, the process including exposing a titania-doped silica soot body to a first thermal treatment by heating the body to a first temperature T1 between about 800° C. and about 1100° C. for a first time duration t1 calculated using the equation:






    t
    ⁢
    1

    >


    L
    c
    2


    4
    ⁢
    α



    ,




    wherein Lc is the characteristic length (cm) of the body and α is the thermal diffusivity (cm2/sec) of the body. The process further including exposing the body to a second thermal treatment by heating the body to a second temperature T2 between about 1050° C. and about 1250° C. wherein, after the second thermal treatment, a peak-to-valley difference of hydroxyl concentration amongst a plurality of segments of the body is about 70 ppm or less.

    DISCHARGE LAMP
    2.
    发明申请
    DISCHARGE LAMP 审中-公开

    公开(公告)号：US20190172698A1

    公开(公告)日：2019-06-06

    申请号：US16095909

    申请日：2017-04-12

    申请人： USHIO DENKI KABUSHIKI KAISHA

    发明人： Yuichi SASAKI ,  Takumi YAMANE

    IPC分类号： H01J61/30 ,  H01J61/16 ,  H01J61/36

    CPC分类号： H01J61/30 ,  C03B2201/075 ,  H01J61/04 ,  H01J61/16 ,  H01J61/36

    摘要： A discharge lamp includes a discharge vessel. A xenon gas is sealed within the discharge vessel so as to serve as a light emitting gas, the discharge vessel is made from quartz glass, a pair of electrodes are arranged so as to face each other in the discharge vessel, and the discharge vessel has a chip portion. The chip portion is made from a glass member that has a composition different from that of the discharge vessel, and the glass member has a transmittance of 50% or more over a wavelength range from 170 nm to 300 nm.

    METHOD FOR PRODUCING IRON-DOPED SILICA GLASS
    4.
    发明申请
    METHOD FOR PRODUCING IRON-DOPED SILICA GLASS 有权
    生产二氧化硅玻璃的方法

    公开(公告)号：US20160200620A1

    公开(公告)日：2016-07-14

    申请号：US14916608

    申请日：2014-09-11

    申请人： HERAEUS QUARZGLAS GMBH & CO. KG

    发明人： Stefan OCHS

    IPC分类号： C03B19/06 ,  C03C3/06 ,  C03B25/02

    CPC分类号： C03B19/06 ,  C03B25/02 ,  C03B37/01413 ,  C03B37/01446 ,  C03B2201/075 ,  C03B2201/40 ,  C03C3/06 ,  C03C2203/00

    摘要： A method for producing a blank of iron-doped silica glass with high silicic acid content for use as heat protection glass is provided. The method involves: (a) producing an iron-doped SiO2 soot body which contains iron in a first oxidation state Fe3+ by flame hydrolysis of a silicon-containing and an iron-containing starting substance, (b) drying the soot body to obtain a mean hydroxyl group content of less than 10 ppm by weight, and (c) vitrifying the soot body under a reducing atmosphere that is suitable for at least partially reducing the iron from the first oxidation state Fe3+ to a second, lower oxidation state Fe2+. A blank is obtained having an iron content between 0.1 and 1% by weight which exhibits an internal transmission of at most 40% in the infrared wavelength range and an internal transmission of at least 85% in the visible spectral range.

    摘要翻译： 本发明提供一种用于制造具有高硅酸含量的掺铁石英玻璃的坯料作为保温玻璃的方法。 该方法包括：（a）通过含硅和含铁起始物质的火焰水解生产含有第一氧化态Fe 3+的铁的掺铁SiO 2烟灰体，（b）干燥烟灰体以获得 平均羟基含量小于10重量ppm，和（c）在适于将铁从第一氧化态Fe 3+至少部分还原为第二次氧化态Fe2 +的还原气氛下使烟灰体玻璃化。 获得的铁含量为0.1至1重量％的空白，其在红外波长范围内具有至多40％的内部透光率，在可见光谱范围内内透光率至少为85％。

    Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component
    9.
    发明授权
    Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component 有权
    用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料

    公开(公告)号：US07980098B2

    公开(公告)日：2011-07-19

    申请号：US12148338

    申请日：2008-04-18

    申请人： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

    发明人： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

    IPC分类号： C03B25/00 ,  C03B27/00 ,  C03B27/012

    CPC分类号： C03B25/02 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/52 ,  Y02P40/57

    摘要： To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).

    摘要翻译： 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。