公开(公告)号：US06200947B1

公开(公告)日：2001-03-13

申请号：US09484217

申请日：2000-01-18

申请人： Masayuki Takashima ,  Kenichi Sawara

发明人： Masayuki Takashima ,  Kenichi Sawara

IPC分类号： C11D904

CPC分类号： C11D7/3209 ,  C11D7/06 ,  C11D7/08 ,  C11D7/34 ,  C11D7/5009 ,  C11D11/0047 ,  C23F11/161 ,  H01L21/02071 ,  H01L21/32134

摘要： There are provided a metal-corrosion inhibitor and a cleaning liquid comprising said corrosion inhibitor, which are suitable for cleaning semiconductor devices, and less than that so far in use in the possibility of affecting human health and the ecological system through a water medium, the corrosion inhibitor comprising an aliphatic alcohol compound having at least one mercapto group in the molecule, wherein a number of carbon atoms constituting said alcohol compound is not less than 2, and a carbon atom bonded with a mercato group and another carbon atom bonded with a hydroxyl group are contiguously bonded with each other.

摘要翻译： 提供了一种金属腐蚀抑制剂和包含适用于清洁半导体器件的所述腐蚀抑制剂的清洗液，并且比通过水介质影响人体健康和生态系统的可能性低得多的清洗液， 包含在分子中具有至少一个巯基的脂肪族醇化合物的腐蚀抑制剂，其中构成所述醇化合物的碳原子数为2以上，和与巯基键合的碳原子和与羟基键合的另一碳原子 组相互粘连。

公开(公告)号：US4906762A

公开(公告)日：1990-03-06

申请号：US232671

申请日：1988-08-16

申请人： Kenichi Sawara ,  Hidekimi Kadokura ,  Tadaaki Yako

发明人： Kenichi Sawara ,  Hidekimi Kadokura ,  Tadaaki Yako

IPC分类号： C07F9/72

CPC分类号： C07F9/723

摘要： According to the process of the present invention, trialkylarsenic compounds having a very high purity of usually over 99% can be obtained by using inexpensive, easily available arsenic oxides and without any complicated operations. The trialkylarsenic compounds thus obtained can be effectively used as a material for compound semiconductors in the field of electronic industry as well as in the field of various chemical industries, and are of great industrial value.

摘要翻译： 根据本发明的方法，通过使用廉价的易于获得的砷氧化物并且没有任何复杂的操作，可以获得通常超过99％的非常高的纯度的三烷基砷化合物。 由此获得的三烷基砷化合物可以有效地用作电子工业领域以及各种化学工业领域的化合物半导体的材料，具有很大的工业价值。

公开(公告)号：US4797500A

公开(公告)日：1989-01-10

申请号：US184115

申请日：1988-04-21

申请人： Hidekimi Kadokura ,  Kenichi Sawara ,  Tadaaki Yako

发明人： Hidekimi Kadokura ,  Kenichi Sawara ,  Tadaaki Yako

IPC分类号： C07F1/06 ,  C07B63/02 ,  C07F5/00 ,  C07F5/06

CPC分类号： C07F5/063 ,  C07F5/00

摘要： A method for purifying an organometallic compound in which an organometallic compound of gallium, aluminum or indium is contacted with at least one metal selected from metallic sodium, metallic potassium and a sodium-potassium alloy. This method is especially efficacious when the high-purity organometallic compound is used as a semiconductor because, by the disclosed method, the silicon components are removed as impurities, which silicon material tends to lower the electrical characteristics of the semiconductor.

摘要翻译： 一种纯化有机金属化合物的方法，其中将镓，铝或铟的有机金属化合物与至少一种选自金属钠，金属钾和钠 - 钾合金的金属接触。 当使用高纯度有机金属化合物作为半导体时，该方法特别有效，因为通过所公开的方法将硅成分作为杂质除去，硅材料倾向于降低半导体的电特性。