公开(公告)号：US06791083B2

公开(公告)日：2004-09-14

申请号：US10207551

申请日：2002-07-29

申请人： Kevin Chan Ee Peng ,  Yelehanka Ramachandramurthy Pradeep ,  Chua Thow Phock

发明人： Kevin Chan Ee Peng ,  Yelehanka Ramachandramurthy Pradeep ,  Chua Thow Phock

IPC分类号： G01N2300

CPC分类号： H01J37/09 ,  H01J2237/28

摘要： An apparatus for preventing distortion to critical dimension line images formed by a SEM under the influence of external electro-magnetic emissions generating by neighboring manufacturing equipment. The external emission causes a high three sigma A/C component. The correcting apparatus includes an external shielding coil mounted to the column housing of the SEM. A control electro-emission driver is mounted to the external shielding coil in which a variable voltage divider having a transformer with a variable resistor. The variable resistor is adjusted varying the amplitude of the sine wave of the A/C signal thus controlling the electro-emission driver while reducing the effects of the three sigma A/C component.

摘要翻译： 一种用于在由相邻制造设备产生的外部电磁发射的影响下由SEM形成的临界尺寸线图像的变形的装置。 外部发射导致高三西格玛A / C分量。 校正装置包括安装在扫描电镜的柱壳体上的外部屏蔽线圈。 控制发光驱动器安装到外部屏蔽线圈，其中具有变压器的可变分压器具有可变电阻器。 调节可变电阻器改变A / C信号的正弦波的振幅，从而控制电发射驱动器，同时减少三西格玛A / C分量的影响。