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1.发明申请HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权保持装置，室外装置和极光超紫外光发生系统公开(公告)号：US20130134330A1
公开(公告)日：2013-05-30
申请号：US13620589
申请日：2012-09-14
CPC分类号： G02B7/02 , G02B7/028 , G02B7/1815 , H05G2/005 , H05G2/008
摘要： A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.
摘要翻译： 用于保持光学元件的保持装置包括具有夹持光学元件的第一和第二构件的保持器，以及用于在第二构件和光学元件之间形成密封的密封构件。
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公开(公告)号：US20130126761A1
公开(公告)日：2013-05-23
申请号：US13562950
申请日：2012-07-31
申请人： Shinji NAGAI , Junichi FUJIMOTO , Kouji ASHIKAWA
发明人： Shinji NAGAI , Junichi FUJIMOTO , Kouji ASHIKAWA
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , G02B5/0891 , G21K5/00 , H05G2/005
摘要： A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.
摘要翻译： 可以与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生EUV光的室; 收集器反射镜，其具有形成在其中心的区域中的第一通孔，并且被构造成收集室内产生的EUV光，收集器反射镜被定位成使得第一通孔位于基本对应于 遮蔽区; 以及蚀刻气体供给单元，设置在所述第一通孔中，并且被配置为向所述室供给蚀刻气体。
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公开(公告)号：US08884257B2
公开(公告)日：2014-11-11
申请号：US13562950
申请日：2012-07-31
申请人： Shinji Nagai , Junichi Fujimoto , Kouji Ashikawa
发明人： Shinji Nagai , Junichi Fujimoto , Kouji Ashikawa
CPC分类号： H05G2/008 , G02B5/0891 , G21K5/00 , H05G2/005
摘要： A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.
摘要翻译： 可以与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生EUV光的室; 收集器反射镜，其具有形成在其中心的区域中的第一通孔，并且被构造成收集室内产生的EUV光，收集器反射镜被定位成使得第一通孔位于基本对应于 遮蔽区; 以及蚀刻气体供给单元，设置在所述第一通孔中，并且被配置为向所述室供给蚀刻气体。
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4.发明授权Holder device, chamber apparatus, and extreme ultraviolet light generation system 有权持有器，腔室装置和极紫外光发生系统公开(公告)号：US08809821B2
公开(公告)日：2014-08-19
申请号：US13620589
申请日：2012-09-14
IPC分类号： G02B7/02
CPC分类号： G02B7/02 , G02B7/028 , G02B7/1815 , H05G2/005 , H05G2/008
摘要： A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.
摘要翻译： 用于保持光学元件的保持装置包括具有夹持光学元件的第一和第二构件的保持器，以及用于在第二构件和光学元件之间形成密封的密封构件。
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