NEUTRON THERAPY APPARATUS
    1.
    发明申请

    公开(公告)号:US20190105512A1

    公开(公告)日:2019-04-11

    申请号:US16212995

    申请日:2018-12-07

    Inventor: Yuanhao LIU

    Abstract: In order to provide a neutron therapy apparatus which give multi angles neutron beam irradiation, the neutron therapy apparatus includes: a beam shaping assembly including a moderator and a reflector surrounding the moderator, wherein the moderator moderates neutrons to a predetermined energy spectrum and the reflector guides deflected neutrons back to enhance the neutron intensity in the predetermined energy spectrum; a neutron generator embedded inside the beam shaping assembly, wherein the neutron generator generates neutrons after irradiated by an ion beam; at least a tube for transmitting the ion beam to the neutron generator, wherein the tube defines at least an axis; deflection magnets for changing the transmission direction of the ion beam; a collimator for concentrating neutrons; and an irradiation room for receiving a irradiated object, wherein the beam shaping assembly rotates around the axis of the tube.

    METHOD OF GENERATING MODIFIED LAYOUT AND SYSTEM THEREFOR

    公开(公告)号:US20170316142A1

    公开(公告)日:2017-11-02

    申请号:US15651616

    申请日:2017-07-17

    Abstract: A method, of generating a modified layout based on an original layout, includes: determining a first set of width bias values of an i-th set of layout patterns which compensate for subtractive process effects, the original layout having N sets of layout patterns corresponding to N masks; determining a second set of width bias values of the i-th set of layout patterns of the original layout which compensate for additive process effects; generating the modified layout based on the first and second sets of width bias values of the i-th set of layout patterns, the order index i of the i-th mask corresponding to an order of the i-th mask being applied during a fabrication process; and fabricating, based on the modified layout, at least one of a semiconductor mask or at least one component in a layer of an inchoate semiconductor integrated circuit.

    ELECTRON BEAM STERILIZATION APPARATUS
    7.
    发明申请

    公开(公告)号:US20170225816A1

    公开(公告)日:2017-08-10

    申请号:US15518883

    申请日:2015-10-05

    Abstract: One object is to provide an electron beam sterilization apparatus including: an inner-surface sterilization chamber (5) including an inner-surface electron beam application device; and a blocking chamber (6) for receiving a preform product (P) from the inner-surface sterilization chamber (5) and blocking X-rays produced by application of the electron beam. The blocking chamber (6) includes an upstream opening (62) and a downstream opening (63) formed therein, the preform product (P) being received through the upstream opening (62) and transferred through the downstream opening (63). The blocking chamber (6) includes: a gripper (74) for gripping the preform product (P); a sterilized rotation table (71) for conveying the gripped preform product (P) in a circular path; and a blocking wall (81) not in contact with the sterilized rotation table (71) and configured to block the X-rays.

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