公开(公告)号：US20050244761A1

公开(公告)日：2005-11-03

申请号：US10918483

申请日：2004-08-16

申请人： Ching-Chin Lai ,  Fang-Cheng Chang ,  Ming-En Chen ,  Jung-Hsiang Chu ,  Kuang-Ling Hsiao ,  Yun-Lin Jang

发明人： Ching-Chin Lai ,  Fang-Cheng Chang ,  Ming-En Chen ,  Jung-Hsiang Chu ,  Kuang-Ling Hsiao ,  Yun-Lin Jang

IPC分类号： G03F7/26 ,  G03C1/492 ,  G03F7/00 ,  G03F7/42 ,  H01L21/02 ,  H01L21/027

CPC分类号： G03F7/00

摘要： A monitoring method for photoresist regeneration, a process and a system for the same are provided. In the photoresist regeneration process of the invention, the solid content and viscosity of photoresist are adjusted by condensation under reduced pressure or dilution with photoresist thinner until the final solid content and viscosity reach the predetermined values thereof obtained through the quantification equation of the invention and then the waste photoresist is caused to pass through filters for removing pollution particles contained therein, such that the regenerated photoresist is acquired.

摘要翻译： 提供了一种用于光致抗蚀剂再生的监测方法，其工艺和系统。 在本发明的光致抗蚀剂再生方法中，光致抗蚀剂的固体含量和粘度通过在减压下缩合或用光致抗蚀剂稀释剂进行稀释来调节，直到最终固体含量和粘度达到通过本发明的定量方程获得的预定值，然后 使废光致抗蚀剂通过用于除去其中所含的污染颗粒的过滤器，从而获得再生的光致抗蚀剂。