公开(公告)号：US20070169793A1

公开(公告)日：2007-07-26

申请号：US11626673

申请日：2007-01-24

申请人： Kumiko Shimada ,  Masanobu Sato

发明人： Kumiko Shimada ,  Masanobu Sato

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/67023 ,  H01L21/6708

摘要： The substrate treatment apparatus includes a substrate holder mechanism for holding a substrate to be treated, and a bifluid nozzle for supplying liquid droplets on a surface of the substrate held by the substrate holder mechanism. The bifluid nozzle has a casing, a liquid outlet port for discharging a treatment liquid, and gas outlet port for discharging a gas, and is adapted to introduce the treatment liquid and the gas into the casing, to generate droplets of the treatment liquid by mixing the treatment liquid discharged from the liquid outlet port with the gas discharged from the gas outlet port outside the casing, and to supply the liquid droplets on the substrate. The density of the liquid droplets supplied from the bifluid nozzle on the substrate surface is not less than 108 droplets/m2 per minute.

摘要翻译： 基板处理装置包括用于保持待处理基板的基板保持机构和用于在由基板保持机构保持的基板的表面上提供液滴的双流喷嘴。 双流喷嘴具有壳体，用于排出处理液的液体出口和用于排出气体的气体出口，并且将处理液和气体引入壳体中，通过混合产生处理液的液滴 所述处理液体从所述液体出口排出，所述气体从所述气体排出口从所述壳体外部排出，并且将所述液滴供应到所述基板上。 从基板表面上的双流喷嘴供给的液滴的密度不小于每分钟10滴/小时/秒。