公开(公告)号：US5622634A

公开(公告)日：1997-04-22

申请号：US358382

申请日：1994-12-19

申请人： Takashi Noma ,  Seijiro Kato ,  Fumio Kishi ,  Hisaaki Kawade ,  Toshikazu Ohnishi ,  Michiyo Nishimura ,  Kumiko Uno ,  Takahiro Horiguchi ,  Masato Yamanobe

发明人： Takashi Noma ,  Seijiro Kato ,  Fumio Kishi ,  Hisaaki Kawade ,  Toshikazu Ohnishi ,  Michiyo Nishimura ,  Kumiko Uno ,  Takahiro Horiguchi ,  Masato Yamanobe

IPC分类号： H01J9/02 ,  B44C1/22

CPC分类号： H01J9/027 ,  H01J2201/3165 ,  H01J2329/00

摘要： An electron-emitting device comprising a pair of device electrodes and an electroconductive film including an electron-emitting region is manufactured by a method comprising a process of forming an electroconductive film including steps of forming a pattern on a thin film containing a metal element on the basis of a difference of chemical state, and removing part of the thin film on the basis of the difference of chemical state.

摘要翻译： 包括一对器件电极和包含电子发射区的导电膜的电子发射器件通过包括形成导电膜的方法制造，所述方法包括以下步骤：在包含金属元素的薄膜上形成图案 基于化学状态的差异，并且基于化学状态的差异去除部分薄膜。