公开(公告)号：US06558741B2

公开(公告)日：2003-05-06

申请号：US09858460

申请日：2001-05-17

申请人： Kunio Kurobe ,  Susumu Aihara

发明人： Kunio Kurobe ,  Susumu Aihara

IPC分类号： B05D506

CPC分类号： G02B5/0858 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3621 ,  C03C17/3649 ,  C03C17/3663 ,  G02B1/105 ,  G02B1/14 ,  Y10S359/90

摘要： Within a chamber in a vacuum atmosphere, SiO is deposited on a glass substrate so as to form a first layer as a protective film, Al is deposited on the first layer so as to form a second layer as an aluminum reflective film, MgF2 is deposited on the second layer so as to form a third layer as a transparent protective film, and CeO2 is deposited on the third layer so as to form a fourth layer as a transparent protective film. Then, while O2 gas is introduced into the chamber, SiO2 is deposited on the fourth layer so as to form a fifth layer as a transparent protective film.

公开(公告)号：US06643078B2

公开(公告)日：2003-11-04

申请号：US10385625

申请日：2003-03-12

申请人： Kunio Kurobe ,  Susumu Aihara

发明人： Kunio Kurobe ,  Susumu Aihara

IPC分类号： G02B508

CPC分类号： G02B5/0858 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3621 ,  C03C17/3649 ,  C03C17/3663 ,  G02B1/105 ,  G02B1/14 ,  Y10S359/90

摘要： Within a chamber in a vacuum atmosphere, SiO is deposited on a glass substrate so as to form a first layer as a protective film, Al is deposited on the first layer so as to form a second layer as an aluminum reflective film, MgF2 is deposited on the second layer so as to form a third layer as a transparent protective film, and CeO2 is deposited on the third layer so as to form a fourth layer as a transparent protective film. Then, while O2 gas is introduced into the chamber, SiO2 is deposited on the fourth layer so as to form a fifth layer as a transparent protective film.