公开(公告)号：US20100208316A1

公开(公告)日：2010-08-19

申请号：US12656293

申请日：2010-01-25

申请人： Oui Serg Kim ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park ,  In Bae Jang

发明人： Oui Serg Kim ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park ,  In Bae Jang

IPC分类号： G03H1/20 ,  G03B27/58

CPC分类号： G03H1/22 ,  G03F7/70408 ,  G03H1/0408 ,  G03H2001/0094

摘要： A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a driving unit disposed between the body and mask stage. A holographic exposure apparatus may include an object supported by a substrate stage, a holographic mask spaced apart from the object and supported by a mask stage, a main body supported by the mask stage, and a driving unit disposed between the mask stage and body to control a gap between the mask stage and body. A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a piezoelectric element disposed between the body and mask stage. The body may include a support arm that supports the element. The mask stage may include a seat arm that supports the element.

摘要翻译： 全息曝光装置可以包括主体，由身体支撑的掩模台，由掩模台支撑的全息掩模，以及设置在主体和掩模台之间的驱动单元。 全息曝光装置可以包括由衬底台支撑的物体，与物体间隔开并由掩模台支撑的全息掩模，由掩模台支撑的主体以及设置在掩模台与主体之间的驱动单元 控制面膜舞台与身体之间的间隙。 全息曝光装置可以包括主体，由主体支撑的掩模台，由掩模台支撑的全息掩模，以及设置在主体和掩模台之间的压电元件。 主体可以包括支撑元件的支撑臂。 掩模台可以包括支撑元件的座臂。

公开(公告)号：US20100208226A1

公开(公告)日：2010-08-19

申请号：US12656291

申请日：2010-01-25

申请人： Oui Serg Kim ,  In Bae Jang ,  Sung Jin Lee ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park

发明人： Oui Serg Kim ,  In Bae Jang ,  Sung Jin Lee ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park

IPC分类号： G03B27/58 ,  G03H1/20

CPC分类号： G03H1/0408 ,  G03F7/70408 ,  G03H2001/0094

摘要： A holographic exposure apparatus may include an object to be exposed, a holographic mask on which a pattern to be transferred onto the object is formed, a stage to support the mask, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the stage. A holographic exposure apparatus also may include an object to be exposed, a mask spaced apart from the object, a holder that holds the mask, and a stage on which the holder is movably mounted such that a gap between the mask and object is adjusted. In addition, a holographic exposure apparatus may include a stage, a prism supported by the stage, a mask spaced apart from the prism and supported by the stage, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the prism.

摘要翻译： 全息曝光装置可以包括要被曝光的物体，其上形成有被转印到物体上的图案的全息掩模，用于支撑掩模的台，以及设置在掩模和台之间以便移动的间隙调节单元 面具相对于舞台。 全息曝光装置还可以包括要曝光的物体，与物体间隔开的掩模，保持掩模的保持器以及保持器可移动地安装在其上的台阶，从而调节掩模和物体之间的间隙。 此外，全息曝光装置可以包括舞台，由舞台支撑的棱镜，与棱镜间隔开并由舞台支撑的掩模以及设置在掩模和舞台之间的间隙调节单元，以便移动面罩相对 到棱镜。