公开(公告)号：US20050218342A1

公开(公告)日：2005-10-06

申请号：US10813682

申请日：2004-03-31

申请人： Engelbertus Antonius Van Der Pasch ,  Marcel Hendrikus Beems ,  Martinus Hendrikus Leenders

发明人： Engelbertus Antonius Van Der Pasch ,  Marcel Hendrikus Beems ,  Martinus Hendrikus Leenders

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70575 ,  G03F7/7005

摘要： A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.

摘要翻译： 光刻设备包括被配置为向照明系统提供辐射的辐射源，所述辐射源被配置为提供在第一波长范围内且在第二波长范围内的第二波长范围与第一波长范围不同的辐射。 支撑件被构造成支撑图案形成装置，图案形成装置被配置成在其横截面中赋予辐射图案。 衬底台被配置为保持衬底，并且投影系统被配置为将图案化的辐射投影到衬底的目标部分上。 第一波长范围是光刻设备的主要波长。 第二波长范围用于光刻设备的设置，该设置包括校准，鉴定，性能测试和对准中的一个或多个。 第二波长范围也可以用于另外的基底的曝光。

公开(公告)号：US20050128461A1

公开(公告)日：2005-06-16

申请号：US10970656

申请日：2004-10-22

申请人： Marcel Hendrikus Beems ,  Engelbertus Antonius Van Der Pasch

发明人： Marcel Hendrikus Beems ,  Engelbertus Antonius Van Der Pasch

IPC分类号： G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03F7/70775

摘要： The invention pertains to a lithographic apparatus including a radiation system configured to condition a beam of radiation; a projection system configured to project the beam of radiation onto a target portion of a substrate; a displacement device configured to move the moveable object relative to the projection system in substantially a first direction and a second direction differing from the first direction; and a measuring device configured to measure a displacement of the moveable object in a third direction, which is substantially perpendicular to the first direction and to the second direction, wherein the measuring device may include an encoder system.

摘要翻译： 本发明涉及一种包括配置成调节辐射束的辐射系统的光刻设备; 投影系统，被配置为将辐射束投影到基板的目标部分上; 位移装置，其构造成在基本上第一方向和与第一方向不同的第二方向上相对于投影系统移动可移动物体; 以及测量装置，被配置为测量所述可移动物体在基本上垂直于所述第一方向和所述第二方向的第三方向上的位移，其中所述测量装置可包括编码器系统。