公开(公告)号：US07355675B2

公开(公告)日：2008-04-08

申请号：US11135630

申请日：2005-05-24

申请人： Sanjay Lalbahadoersing ,  Marco Johannes Annemarie Pieters ,  Jan Hauschild ,  Coen Van De Vin

发明人： Sanjay Lalbahadoersing ,  Marco Johannes Annemarie Pieters ,  Jan Hauschild ,  Coen Van De Vin

IPC分类号： G03B27/42

CPC分类号： G03F9/7084 ,  G03F7/70633

摘要： A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.

摘要翻译： 一种用于测量由衬底提供的信息的方法。 衬底包括由光刻设备产生的特征。 该方法包括将光束投射到设置在基板上的特征上方和/或附近的标记上，以及用传感器检测由标记提供的信息。 涂层设置在基板上，使得涂层位于光束和特征之间，以基本上防止光束被特征反射并导致由标记提供的信息的不准确的读出。