公开(公告)号：US07485580B2

公开(公告)日：2009-02-03

申请号：US11518958

申请日：2006-09-12

申请人： Andrew David Johnson ,  Peter James Maroulis ,  Mark Ian Sistern ,  Martin Jay Plishka ,  Steven Arthur Rogers ,  John Bartram Dickenson

发明人： Andrew David Johnson ,  Peter James Maroulis ,  Mark Ian Sistern ,  Martin Jay Plishka ,  Steven Arthur Rogers ,  John Bartram Dickenson

IPC分类号： H01L21/461

CPC分类号： H01L51/0017 ,  H01L51/56

摘要： A process for removing organic electroluminescent residues from a substrate is described herein. The process includes the steps of providing a process gas comprising a fluorine-containing gas, optionally an oxygen-containing gas, and optionally an additive gas; activating the process gas in a remote chamber using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the organic electroluminescent residue from the surface.

摘要翻译： 本文描述了从底物中除去有机电致发光残余物的方法。 该方法包括提供包括含氟气体，任选地含氧气体和任选的添加气体的工艺气体的步骤; 使用至少一个能量源来激活远程室中的处理气体以提供反应物种; 并使基材的表面与反应性物质接触，从表面挥发除去有机电致发光残渣。

公开(公告)号：US07371688B2

公开(公告)日：2008-05-13

申请号：US10942301

申请日：2004-09-15

申请人： Bing Ji ,  Martin Jay Plishka ,  Dingjun Wu ,  Peter Richard Badowski ,  Eugene Joseph Karwacki, Jr.

发明人： Bing Ji ,  Martin Jay Plishka ,  Dingjun Wu ,  Peter Richard Badowski ,  Eugene Joseph Karwacki, Jr.

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/32135 ,  C23C16/4405 ,  C23G5/00 ,  H01L21/32136 ,  Y10S438/905

摘要： A process for the selective removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance from a substrate comprising: providing the substrate having the substance deposited thereupon wherein the substance comprises a transition metal ternary compound, a transition metal quaternary compound, and combinations thereof; reacting the substance with a process gas comprising a fluorine-containing gas and optionally an additive gas to form a volatile product; and removing the volatile product from the substrate to thereby remove the substance from the substrate.

摘要翻译： 本文公开了用于选择性地从衬底中去除蚀刻和/或清洁应用的物质的方法。 在一个实施方案中，提供了从基材中除去物质的方法，包括：提供具有沉积在其上的物质的基材，其中所述物质包含过渡金属三元化合物，过渡金属季铵化合物及其组合; 使物质与包含含氟气体和任选的添加气体的工艺气体反应以形成挥发性产物; 并从基材中除去挥发性产物，从而从基材中除去物质。