公开(公告)号：US06599670B2

公开(公告)日：2003-07-29

申请号：US09866617

申请日：2001-05-30

申请人： Masao Ikuno ,  Masahiko Kishi ,  Masaaki Yomo

发明人： Masao Ikuno ,  Masahiko Kishi ,  Masaaki Yomo

IPC分类号： G03F900

CPC分类号： G03F7/70533 ,  G03F7/70558 ,  G03F7/70625

摘要： A method of determining an exposure value for exposing a resist film, comprises the steps of: estimating a size variation of a resist pattern from a predetermined target size based on a waiting time of a currently processing resist film to be patterned in subsequent sequential exposure and development processes; and compensating a reference exposure value based on said size variation to obtain a compensated exposure value.

摘要翻译： 一种确定用于曝光抗蚀剂膜的曝光值的方法，包括以下步骤：基于在随后的顺序曝光中待图案化的当前处理的抗蚀剂膜的等待时间，从预定目标尺寸估计抗蚀剂图案的尺寸变化;以及 开发过程; 以及基于所述尺寸变化补偿参考曝光值以获得补偿曝光值。