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公开(公告)号:US20070216883A1
公开(公告)日:2007-09-20
申请号:US11378634
申请日:2006-03-20
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/2043
摘要: An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.