公开(公告)号：US20070046920A1

公开(公告)日：2007-03-01

申请号：US11209032

申请日：2005-08-23

Applicant: Hans Laan ,  Johannes Quaedackers

Inventor： Hans Laan ,  Johannes Quaedackers

IPC: G03B27/72

CPC classification number: G03F7/70941 ,  G03F7/70533 ,  G03F7/70625

Abstract: A lithographic apparatus having a controller that sets at lest one system parameter such that the difference between the critical dimension of pattern features formed on the substrate in regions of relatively high and relatively low pattern feature density is minimised for an area on the substrate on which a patterned beam of radiation is to be projected and which re-sets the at least one system parameter between a projection of the patterned radiation beam onto two areas of the substrate.

Abstract translation: 一种光刻设备，其具有控制器，该控制器设置至少一个系统参数，使得在基板上形成的图案特征的相对高度和相对低图案特征密度区域中的图案特征的临界尺寸之间的差最小化， 图案化的辐射束将被投影，并且将图案化的辐射束的投影重新设置在衬底的两个区域上的至少一个系统参数。

公开(公告)号：US20070099100A1

公开(公告)日：2007-05-03

申请号：US11582566

申请日：2006-10-18

Applicant: Jozef Finders ,  Johannes Quaedackers ,  Judocus Stoeldraijer ,  Johannes De Klerk ,  Alexander Serebryakov

Inventor： Jozef Finders ,  Johannes Quaedackers ,  Judocus Stoeldraijer ,  Johannes De Klerk ,  Alexander Serebryakov

IPC: G03B27/00 ,  G03B27/42 ,  G03C5/04 ,  G03C5/00

CPC classification number: G03F7/70333 ,  G03F7/70425

Abstract: A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.

Abstract translation: 一种改善光刻工艺均匀性的方法。 在一个方面，通过在衬底曝光期间向第一光刻设备中的台提供连续的z运动来匹配第一和第二光刻设备的概率密度函数。 优选地，z运动的特征在于正态分布函数，其中第一装置的有效概率密度函数基本上类似于第二装置的概率密度函数。

公开(公告)号：US20070216883A1

公开(公告)日：2007-09-20

申请号：US11378634

申请日：2006-03-20

Applicant: Johannes Quaedackers ,  Koen Van Ingen Schenau ,  Patrick Wong ,  Michel Franciscus Van Rooy

Inventor： Johannes Quaedackers ,  Koen Van Ingen Schenau ,  Patrick Wong ,  Michel Franciscus Van Rooy

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/2043

Abstract: An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.

公开(公告)号：US20060033898A1

公开(公告)日：2006-02-16

申请号：US11205325

申请日：2005-08-17

Applicant: Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

Inventor： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

IPC: G03B27/42

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Abstract translation: 公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。