公开(公告)号：US07417712B2

公开(公告)日：2008-08-26

申请号：US11246036

申请日：2005-10-06

申请人： Miwaki Ando ,  Yoshinori Ohsaki

发明人： Miwaki Ando ,  Yoshinori Ohsaki

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03F7/706

摘要： Provided is an exposure apparatus including a projection optical system for projecting an exposure pattern onto an object to be exposed, a measurement device for measuring an optical performance of the projection optical system by guiding light to the projection optical system through a measurement pattern to detect interference fringes formed by the light emitted from the projection optical system, and an adjustment portion for adjusting a numerical aperture of the light that illuminates the measurement pattern, in which the adjustment portion adjusts the numerical aperture so that the visibility of the interference fringes V, which is defined as V=(Imax−Imin)/(Imax+Imin), is equal to or more than 0.3, where Imax represents the maximum amount of light of the interference fringes, and Imin represents the minimum amount of light of the interference fringes, when the measurement device measures an optical performance of the projection optical system.

摘要翻译： 本发明提供一种曝光装置，包括用于将曝光图案投影到被曝光物体上的投影光学系统，用于通过测量图案将光引导到投影光学系统以检测干涉来测量投影光学系统的光学性能的测量装置 由投影光学系统发射的光形成的条纹以及用于调节照亮测量图案的光的数值孔径的调节部分，其中调节部分调节数值孔径，使得干涉条纹V的可见度，其中 被定义为V =（I max max -I min min）/（I max max + I min min），是 等于或大于0.3，其中I 最大表示干涉条纹的最大光量，I min表示干涉条纹的最小光量，当 测量装置测量光的性能 e投影光学系统。