公开(公告)号：US5221201A

公开(公告)日：1993-06-22

申请号：US734784

申请日：1991-07-23

申请人： Kenichi Yamaga ,  Katsutoshi Ishii ,  Naotaka Ogino

发明人： Kenichi Yamaga ,  Katsutoshi Ishii ,  Naotaka Ogino

IPC分类号： C30B31/10 ,  F27B17/00

CPC分类号： F27B17/0025 ,  C30B31/103 ,  Y10S414/137 ,  Y10S414/14

摘要： A vertical heat treatment apparatus includes a casing, a vertical heat treatment furnace provided in the casing, a substrate holding unit mounted in the casing for holding substrates to be heat-treated in the vertical heat treatment furnace, a loading/unloading unit having a wafer boat for supporting the substrates, the loading/unloading unit being adapted to put the substrates in and take the same out of the vertical heat treatment furnace, and a transportation robot for moving the substrates between the substrate holding unit and the wafer boat. The vertical heat treatment apparatus further includes a clean air supplying unit for supplying clean air sideways to the wafers supported by the wafer boat when the loading/unloading unit is at an unloading position, a and duct for introducing air from the outside of the apparatus. The clean air supplying unit is provided with an air filter disposed opposed to the wafer boat. Air in a clean room whose pressure is set to be higher than the pressure in the casing is introduced into the clean air supplying unit through the duct.

摘要翻译： 立式热处理装置包括壳体，设置在壳体中的立式热处理炉，安装在壳体中用于保持在立式热处理炉中进行热处理的基板的基板保持单元，具有晶片的装载/卸载单元 用于支撑基板的装载/卸载单元适于将基板放入立式热处理炉中并将其取出，以及用于在基板保持单元和晶片舟皿之间移动基板的输送机器人。 垂直热处理装置还包括清洁空气供给单元，用于当装载/卸载单元处于卸载位置时，向由晶圆舟支撑的晶片横向地供应清洁空气，以及用于从设备的外部引入空气的管道。 清洁空气供给单元设置有与晶片舟相对设置的空气过滤器。 将其压力设定得高于壳体内的压力的洁净室内的空气通过导管引入清洁空气供给单元。