公开(公告)号：US20010053489A1

公开(公告)日：2001-12-20

申请号：US09878981

申请日：2001-06-12

申请人： PHILIPS CORPORATION and ASM LITHOGRAPHY B.V.

发明人： Peter Dirksen ,  Casparus A.H. Juffermans

IPC分类号： G03C005/00 ,  G03B027/00 ,  G06K009/00

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70358 ,  Y10S430/143

摘要： Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure (22) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each type of aberration, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. Each type of aberration is represented by a specific Fourier harmonic (Znull), which is composed of Zernike coefficients (Znull), each representing a specific lower or higher order sub-aberration. The new method enables to determine these sub-aberrations The new method may be used for measuring a projection system for a lithographic projection apparatus.

摘要翻译： 可以通过成像系统在光致抗蚀剂（PR）上成像圆形相结构（22），以准确和可靠的方式检测成像系统（PL）的像差，显影抗蚀剂并用扫描扫描 检测装置（SEM），其耦合到图像处理器（IP）。 圆形相结构以环形结构（25）成像，并且每种类型的像差（如昏迷，散光，三点像差等）导致内部轮廓（CI）和外部轮廓（CI）的形状的特定变化 CE）和/或这些轮廓之间的距离的变化，使得能够彼此独立地检测像差。 每种类型的像差由特定的傅立叶谐波（Z-）表示，其由Zernike系数（Z-）组成，每个代表特定的较低或更高阶的子像差。 新方法可以确定这些子像差新方法可用于测量光刻投影设备的投影系统。