Photo method of making tri-level density photomask
    3.
    发明授权
    Photo method of making tri-level density photomask 失效
    制作三层密度光掩模的照片方法

    公开(公告)号:US4374911A

    公开(公告)日:1983-02-22

    申请号:US112246

    申请日:1980-01-14

    IPC分类号: G03F1/00 G03C5/04

    CPC分类号: G03F1/50

    摘要: A method of fabricating a photomask having at least three distinct zones of light transmissibility is disclosed. A first mask is made from a predetermined pattern, this mask having only two distinct zones of light transmissibility. A second mask, made by contact printing of a diazo film, is formed from a selected portion of one zone of the original pattern, which zone has the greater light transmissibility. The second mask, being a contact print, is the photographic opposite of the first. The two masks are then aligned with the selected portion of the second mask superimposed over its original location in the first mask and a composite latent image thereof is formed in a suitable emulsion. This composite image is then developed and fixed on an appropriate support to form a photomask having at least three density zones.

    摘要翻译: 公开了一种制造具有至少三个不同光透射区的光掩模的方法。 第一掩模由预定图案制成,该掩模仅具有两个不同的透光性区域。 通过重氮膜的接触印刷制成的第二掩模由原始图案的一个区域的选定部分形成,该区域具有更大的透光性。 作为接触印刷的第二个面具是与第一个面对照的相对照片。 然后将两个掩模与在第一掩模中叠加在其原始位置上的第二掩模的选定部分对准,并且其复合潜像形成为合适的乳液。 然后将该复合图像显影并固定在适当的载体上以形成具有至少三个密度区的光掩模。