XY STAGE DEVICE, SEMICONDUCTOR INSPECTION APPARATUS, AND SEMICONDUCTOR EXPOSURE APPARATUS
    1.
    发明申请
    XY STAGE DEVICE, SEMICONDUCTOR INSPECTION APPARATUS, AND SEMICONDUCTOR EXPOSURE APPARATUS 有权
    XY阶段装置,半导体检查装置和半导体曝光装置

    公开(公告)号:US20100250004A1

    公开(公告)日:2010-09-30

    申请号:US12725821

    申请日:2010-03-17

    IPC分类号: G05D3/12

    摘要: An XY stage device having an X-axis movable body which moves in the X-axis direction on a platen, and a Y-axis movable body which moves in the Y-axis direction on the platen and guides the movement of the X-axis movable body in the X-axis direction. The XY stage device includes a pair of actuators which can be provided so as to be separated from each other in the X-axis direction, and drives the Y-axis movable body in the Y-axis direction, a detector which detects the yawing angle that can be the angle of the Y-axis movable body in a rotational direction around the Z-axis, a controller which controls the driving of the pair of actuators on the basis of the yawing angle detected by the detector, and a pair of supporters which supports the Y-axis movable body on the platen. One of the pair of supporters can be a rolling guide which guides the movement of the Y-axis movable body in the Y-axis direction, and the other of the pair of supporters can be an air pad which supports the Y-axis movable body in non-contact with the platen.

    摘要翻译: 具有在台板上沿X轴方向移动的X轴移动体和Y轴移动体的XY平台装置,其沿着Y轴方向移动到台板上并引导X轴的移动 移动体在X轴方向。 XY台装置包括一对致动器,其可以设置成在X轴方向上彼此分离并且驱动Y轴可移动体在Y轴方向上,检测器检测偏航角 可以是围绕Z轴的旋转方向上的Y轴移动体的角度,基于由检测器检测出的偏航角来控制一对致动器的驱动的控制器,以及一对支撑体 其支撑台板上的Y轴可移动体。 一对支撑体中的一个可以是引导Y轴可移动体在Y轴方向上的运动的滚动导轨,另一个支撑件可以是支撑Y轴移动体的气垫 与压板非接触。

    Stage device
    2.
    发明申请
    Stage device 有权
    舞台装置

    公开(公告)号:US20090245980A1

    公开(公告)日:2009-10-01

    申请号:US12232266

    申请日:2008-09-12

    IPC分类号: H01L21/673

    摘要: The vibrations of a second table supported on a first table that is movable in one horizontal direction can be controlled. A stage device includes an XY axis table movable in the X-direction, a Z-axis table supported by a support portion on the XY axis table, a pair of scales that are arranged apart from each other in the X-direction and detect the Z-direction velocity on the Z-axis table, a pair of motors that are arranged apart from each other in the X-direction and drive the Z-axis table in a vertical direction on the Z-axis-table, and a controller controls the drives of the motors based on the Z-direction velocity detected, in which the behavior of pitching vibrations in the Z-axis table is determined by detecting the Z-direction velocity with the scales, and the motors are driven and then the Z-axis table is rotated in a pitching direction so that the pitching vibrations are cancelled.

    摘要翻译: 可以控制支撑在第一工作台上的在一个水平方向上可移动的第二工作台的振动。 舞台装置包括可沿X方向移动的XY轴台,由XY轴台上的支撑部支撑的Z轴台,在X方向上彼此分离地布置的一对秤, Z轴台上的Z方向速度,在X方向上彼此分离配置并在Z轴台上沿Z轴方向驱动Z轴台的一对电动机,控制器控制 根据检测到的Z方向速度的电动机的驱动,其中通过用秤测定Z方向速度来确定Z轴工作台中的俯仰振动的行为,并且驱动电动机,然后Z- 轴台在俯仰方向旋转,从而抵消俯仰振动。

    Stage apparatus
    3.
    发明申请
    Stage apparatus 有权
    舞台装置

    公开(公告)号:US20080087791A1

    公开(公告)日:2008-04-17

    申请号:US11984170

    申请日:2007-11-14

    申请人: Ryuta Nakajima

    发明人: Ryuta Nakajima

    IPC分类号: F16M13/00

    摘要: A stage apparatus, includes a holding member configured to hold a subject; an elevation supporting member configured to support the holding member so that the holding member can go up and down; a rotation supporting member configured to support the elevation supporting member so that the elevation supporting member can be rotated with respect to a Z axis; and a Z axis driving part configured to elevate the holding member in a Z axial direction; wherein the Z axis driving part is located on the rotation supporting member and makes the holding member go up and down relative to the rotation supporting member.

    摘要翻译: 舞台装置包括被配置为保持被摄体的保持构件; 升降支撑构件,其构造成支撑所述保持构件,使得所述保持构件能够上下移动; 旋转支撑构件,其构造成支撑所述仰角支撑构件,使得所述仰角支撑构件能够相对于Z轴旋转; 以及Z轴驱动部,其构造成使所述保持部件沿Z轴方向升高; 其中,所述Z轴驱动部位于所述旋转支撑部件上,并且使所述保持部件相对于所述旋转支撑部件上下移动。

    XY stage device, semiconductor inspection apparatus, and semiconductor exposure apparatus
    4.
    发明授权
    XY stage device, semiconductor inspection apparatus, and semiconductor exposure apparatus 有权
    XY平台装置,半导体检查装置和半导体曝光装置

    公开(公告)号:US08517363B2

    公开(公告)日:2013-08-27

    申请号:US12725821

    申请日:2010-03-17

    IPC分类号: G05D3/12

    摘要: An XY stage device having an X-axis movable body which moves in the X-axis direction on a platen, and a Y-axis movable body which moves in the Y-axis direction on the platen and guides the movement of the X-axis movable body in the X-axis direction. The XY stage device includes a pair of actuators which can be provided so as to be separated from each other in the X-axis direction, and drives the Y-axis movable body in the Y-axis direction, a detector which detects the yawing angle that can be the angle of the Y-axis movable body in a rotational direction around the Z-axis, a controller which controls the driving of the pair of actuators on the basis of the yawing angle detected by the detector, and a pair of supporters which supports the Y-axis movable body on the platen. One of the pair of supporters can be a rolling guide which guides the movement of the Y-axis movable body in the Y-axis direction, and the other of the pair of supporters can be an air pad which supports the Y-axis movable body in non-contact with the platen.

    摘要翻译: 具有在台板上沿X轴方向移动的X轴移动体和Y轴移动体的XY平台装置,其沿着Y轴方向移动到台板上并引导X轴的移动 移动体在X轴方向。 XY台装置包括一对致动器,其可以设置成在X轴方向上彼此分离并且驱动Y轴可移动体在Y轴方向上,检测器检测偏航角 可以是围绕Z轴的旋转方向上的Y轴移动体的角度,基于由检测器检测出的偏航角来控制一对致动器的驱动的控制器,以及一对支撑体 其支撑台板上的Y轴可移动体。 一对支撑体中的一个可以是引导Y轴可移动体在Y轴方向上的运动的滚动导轨,另一个支撑件可以是支撑Y轴移动体的气垫 与压板非接触。

    HYDROSTATIC BEARING AND STAGE APPARATUS
    5.
    发明申请
    HYDROSTATIC BEARING AND STAGE APPARATUS 有权
    防静电轴承和舞台设备

    公开(公告)号:US20090016651A1

    公开(公告)日:2009-01-15

    申请号:US12168235

    申请日:2008-07-07

    IPC分类号: F16C32/06

    摘要: A hydrostatic bearing configured to slide along a sliding surface of a structural body in a non-contact manner, the hydrostatic bearing includes a jetting part having a jetting surface configured to jet air onto the sliding surface; and a suction part having a suction surface configured to suction the air jetted from the jetting surface onto the sliding surface. The suction surface is situated at one of an internal circumferential side and an external circumferential side of the jetting part and is positioned higher than a lower end of the jetting part.

    摘要翻译: 静压轴承构造成以非接触方式沿着结构体的滑动表面滑动,静压轴承包括具有喷射表面的喷射表面的喷射部分,喷射表面被配置为将空气喷射到滑动表面上; 以及具有吸引表面的抽吸部件,其被构造成将从喷射表面喷射的空气吸入滑动表面。 吸引面位于喷射部的内周侧和外周侧之一,并且位于比喷射部的下端高的位置。

    Stage device
    6.
    发明授权
    Stage device 有权
    舞台装置

    公开(公告)号:US08019448B2

    公开(公告)日:2011-09-13

    申请号:US12232266

    申请日:2008-09-12

    IPC分类号: G06F19/00

    摘要: The vibrations of a second table supported on a first table that is movable in one horizontal direction can be controlled. A stage device includes an XY axis table movable in the X-direction, a Z-axis table supported by a support portion on the XY axis table, a pair of scales that are arranged apart from each other in the X-direction and detect the Z-direction velocity on the Z-axis table, a pair of motors that are arranged apart from each other in the X-direction and drive the Z-axis table in a vertical direction on the Z-axis-table, and a controller controls the drives of the motors based on the Z-direction velocity detected, in which the behavior of pitching vibrations in the Z-axis table is determined by detecting the Z-direction velocity with the scales, and the motors are driven and then the Z-axis table is rotated in a pitching direction so that the pitching vibrations are cancelled.

    摘要翻译: 可以控制支撑在第一工作台上的在一个水平方向上可移动的第二工作台的振动。 舞台装置包括可沿X方向移动的XY轴台,由XY轴台上的支撑部支撑的Z轴台,在X方向上彼此分离地布置的一对秤, Z轴台上的Z方向速度,在X方向上彼此分离配置并在Z轴台上沿Z轴方向驱动Z轴台的一对电动机,控制器控制 根据检测到的Z方向速度的电动机的驱动,其中通过用秤测定Z方向速度来确定Z轴工作台中的俯仰振动的行为,并且驱动电动机,然后Z- 轴台在俯仰方向旋转,从而抵消俯仰振动。

    Stage apparatus
    7.
    发明授权
    Stage apparatus 有权
    舞台装置

    公开(公告)号:US07997567B2

    公开(公告)日:2011-08-16

    申请号:US11984170

    申请日:2007-11-14

    申请人: Ryuta Nakajima

    发明人: Ryuta Nakajima

    IPC分类号: B23Q1/64

    摘要: A stage apparatus, includes a holding member configured to hold a subject; an elevation supporting member configured to support the holding member so that the holding member can go up and down; a rotation supporting member configured to support the elevation supporting member so that the elevation supporting member can be rotated with respect to a Z axis; and a Z axis driving part configured to elevate the holding member in a Z axial direction; wherein the Z axis driving part is located on the rotation supporting member and makes the holding member go up and down relative to the rotation supporting member.

    摘要翻译: 舞台装置包括被配置为保持被摄体的保持构件; 升降支撑构件,其构造成支撑所述保持构件,使得所述保持构件能够上下移动; 旋转支撑构件,其构造成支撑所述仰角支撑构件,使得所述仰角支撑构件能够相对于Z轴旋转; 以及Z轴驱动部,其构造成使所述保持部件沿Z轴方向升高; 其中,所述Z轴驱动部位于所述旋转支撑部件上,并且使所述保持部件相对于所述旋转支撑部件上下移动。

    Hydrostatic bearing and stage apparatus
    8.
    发明授权
    Hydrostatic bearing and stage apparatus 有权
    静压轴承和平台装置

    公开(公告)号:US07946767B2

    公开(公告)日:2011-05-24

    申请号:US12168235

    申请日:2008-07-07

    IPC分类号: F16C32/06

    摘要: A hydrostatic bearing configured to slide along a sliding surface of a structural body in a non-contact manner, the hydrostatic bearing includes a jetting part having a jetting surface configured to jet air onto the sliding surface; and a suction part having a suction surface configured to suction the air jetted from the jetting surface onto the sliding surface. The suction surface is situated at one of an internal circumferential side and an external circumferential side of the jetting part and is positioned higher than a lower end of the jetting part.

    摘要翻译: 静压轴承构造成以非接触方式沿着结构体的滑动表面滑动,静压轴承包括具有喷射表面的喷射表面的喷射部分,喷射表面被配置为将空气喷射到滑动表面上; 以及具有吸引表面的抽吸部件,其被构造成将从喷射表面喷射的空气吸入滑动表面。 吸引面位于喷射部的内周侧和外周侧之一,并且位于比喷射部的下端高的位置。