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公开(公告)号：US08178368B2
公开(公告)日：2012-05-15
申请号：US12621513
申请日：2009-11-19
IPC分类号： G06F17/50
CPC分类号： H01L22/12
摘要： A method of forming a device is disclosed. The method includes providing a substrate on which the device is formed. It also includes forming a test cell on the substrate. The test cell includes a defect programmed into the cell to facilitate defect detection.
摘要翻译： 公开了一种形成装置的方法。 该方法包括提供其上形成有该器件的衬底。 它还包括在衬底上形成测试电池。 测试单元包括编程到单元中以便于缺陷检测的缺陷。
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公开(公告)号：US20110116085A1
公开(公告)日：2011-05-19
申请号：US12621510
申请日：2009-11-19
CPC分类号： H01L22/12
摘要： A method of forming a device is disclosed. The method includes providing a substrate and processing a layer of the device on the substrate. The layer is inspected with an inspection tool for defects. The inspection tool is programmed with an inspection recipe determined from studying defects programmed into the layer at known locations.
摘要翻译： 公开了一种形成装置的方法。 该方法包括提供衬底并在衬底上处理器件的一层。 该层用检查工具检查缺陷。 检查工具用从在已知位置处编程到层中的缺陷来确定的检查配方来编程。
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公开(公告)号：US20110114949A1
公开(公告)日：2011-05-19
申请号：US12621513
申请日：2009-11-19
IPC分类号： H01L23/544 , H01L21/66 , G06F17/50
CPC分类号： H01L22/12
摘要： A method of forming a device is disclosed. The method includes providing a substrate on which the device is formed. It also includes forming a test cell on the substrate. The test cell includes a defect programmed into the cell to facilitate defect detection.
摘要翻译： 公开了一种形成装置的方法。 该方法包括提供其上形成有器件的衬底。 它还包括在衬底上形成测试电池。 测试单元包括编程到单元中以便于缺陷检测的缺陷。
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公开(公告)号：US08289508B2
公开(公告)日：2012-10-16
申请号：US12621510
申请日：2009-11-19
IPC分类号： G01N21/00
CPC分类号： H01L22/12
摘要： A method of forming a device is disclosed. The method includes providing a substrate and processing a layer of the device on the substrate. The layer is inspected with an inspection tool for defects. The inspection tool is programmed with an inspection recipe determined from studying defects programmed into the layer at known locations.
摘要翻译： 公开了一种形成装置的方法。 该方法包括提供衬底并在衬底上处理器件的一层。 该层用检查工具检查缺陷。 检查工具用从在已知位置处编程到层中的缺陷来确定的检查配方来编程。
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