公开(公告)号：US20160260824A1

公开(公告)日：2016-09-08

申请号：US14986150

申请日：2015-12-31

Applicant: Florin Udrea ,  Alice Pei-Shan Hsieh ,  Gianluca Camuso ,  Chiu Ng ,  Yi Tang ,  Rajeev Krishna Vytla

Inventor： Florin Udrea ,  Alice Pei-Shan Hsieh ,  Gianluca Camuso ,  Chiu Ng ,  Yi Tang ,  Rajeev Krishna Vytla

IPC: H01L29/739 ,  H01L29/10 ,  H01L29/06

CPC classification number: H01L29/7397 ,  H01L29/0634 ,  H01L29/41708 ,  H01L29/7394

Abstract: There are disclosed herein various implementations of a bipolar semiconductor device having a charge-balanced inter-trench structure. Such a device includes a drift region having a first conductivity type situated over an anode layer having a second conductivity type. The device also includes first and second control trenches extending through an inversion region having the second conductivity type into the drift region, each of the first and second control trenches being bordered by a cathode diffusion having the first conductivity type. In addition, the device includes an inter-trench structure situated in the drift region between the first and second control trenches. The inter-trench structure includes one or more first conductivity regions having the first conductivity type and one or more second conductivity region having the second conductivity type, the one or more first conductivity regions and the one or more second conductivity regions configured to substantially charge-balance the inter-trench structure.

Abstract translation: 这里公开了具有电荷平衡的沟槽间结构的双极半导体器件的各种实施方式。 这种器件包括位于具有第二导电类型的阳极层上的具有第一导电类型的漂移区。 该器件还包括延伸穿过具有第二导电类型的反向区域到漂移区域中的第一和第二控制沟槽，第一和第二控制沟槽中的每一个都由具有第一导电类型的阴极扩散区界定。 此外，该器件包括位于第一和第二控制沟槽之间的漂移区域中的沟槽间结构。 沟槽间结构包括具有第一导电类型的一个或多个第一导电区域和具有第二导电类型的一个或多个第二导电区域，一个或多个第一导电区域和一个或多个第二导电区域， 平衡沟槽间结构。