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公开(公告)号:US20050170296A1
公开(公告)日:2005-08-04
申请号:US10766526
申请日:2004-01-29
IPC分类号: H01L21/027 , G03F7/00 , G03F7/20
CPC分类号: G03F7/70066 , G03F7/70425 , G03F7/70475 , G03F7/707
摘要: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
摘要翻译: 光刻设备具有适于在至少两个位置容纳掩模的掩模台,使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光,然后执行第二 第二位置的面罩曝光。