Semiconductor component with silicon wiring and method of fabricating the component
    2.
    发明授权
    Semiconductor component with silicon wiring and method of fabricating the component 有权
    具有硅布线的半导体元件及其制造方法

    公开(公告)号:US06429520B1

    公开(公告)日:2002-08-06

    申请号:US09391039

    申请日:1999-09-07

    IPC分类号: H01L2348

    摘要: A semiconductor component has local silicon wiring. A first silicon region and a second silicon region are doped with dopants of opposite conductivity. The second silicon region is arranged at least partially over the first silicon region and is separated from it by an insulation layer. The insulation layer is formed with an opening. A conductive layer is disposed at the opening. The conductive layer is composed of a metal, a metal nitride or a combination thereof and connects the first and the second silicon regions electrically to one another.

    摘要翻译: 半导体元件具有局部硅布线。 第一硅区域和第二硅区域掺杂有相反导电性的掺杂剂。 第二硅区域至少部分地布置在第一硅区域之上并且通过绝缘层与其分离。 绝缘层形成有开口。 导电层设置在开口处。 导电层由金属,金属氮化物或其组合构成,并且将第一和第二硅区彼此电连接。