公开(公告)号：US08245161B1

公开(公告)日：2012-08-14

申请号：US12190017

申请日：2008-08-12

申请人： Marco Tortonese ,  Rene Blanquies

发明人： Marco Tortonese ,  Rene Blanquies

IPC分类号： G06F17/50

CPC分类号： G03F1/70 ,  G03F1/68 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70516

摘要： A method for calibrating a computer program that simulates a physical process and a photomask are disclosed. A first physical artifact may be exposed to the physical process to produce a second physical artifact. The first physical artifact may include one or more features characterized by traceably measured known dimensions. One or more features of the second physical artifact may be measured to produce one or more measured dimensions. The physical process may be simulated with a computer simulation using the known dimensions of the first physical artifact as inputs to produce an output. The output may be compared to the measured dimensions of the second physical artifact to produce a result. A figure of merit may be assigned to the computer simulation based on the result. The photomask may have one or more features with one or more traceably measured dimensions.

摘要翻译： 公开了一种用于校准模拟物理过程和光掩模的计算机程序的方法。 第一物理工件可能暴露于物理过程以产生第二物理工件。 第一物理工件可以包括以可追溯测量的已知尺寸为特征的一个或多个特征。 可以测量第二物理赝象的一个或多个特征以产生一个或多个测量尺寸。 物理过程可以使用计算机模拟，使用第一物理伪像的已知尺寸作为输出来产生输出。 可以将输出与第二物理伪像的测量尺寸进行比较以产生结果。 可以根据结果为计算机模拟分配品质因数。 光掩模可以具有一个或多个具有一个或多个可追溯测量尺寸的特征。

公开(公告)号：US08943443B1

公开(公告)日：2015-01-27

申请号：US13564113

申请日：2012-08-01

申请人： Marco Tortonese ,  Rene Blanquies

发明人： Marco Tortonese ,  Rene Blanquies

IPC分类号： G06F17/50

CPC分类号： G03F1/70 ,  G03F1/68 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70516

摘要： A method for calibrating a computer program that simulates a physical process and a photomask are disclosed. A first physical artifact may be exposed to the physical process to produce a second physical artifact. The first physical artifact may include one or more features characterized by traceably measured known dimensions. One or more features of the second physical artifact may be measured to produce one or more measured dimensions. The physical process may be simulated with a computer simulation using the known dimensions of the first physical artifact as inputs to produce an output. The output may be compared to the measured dimensions of the second physical artifact to produce a result. A figure of merit may be assigned to the computer simulation based on the result. The photomask may have one or more features with one or more traceably measured dimensions.

摘要翻译： 公开了一种用于校准模拟物理过程和光掩模的计算机程序的方法。 第一物理工件可能暴露于物理过程以产生第二物理工件。 第一物理工件可以包括以可追溯测量的已知尺寸为特征的一个或多个特征。 可以测量第二物理赝象的一个或多个特征以产生一个或多个测量尺寸。 物理过程可以使用计算机模拟，使用第一物理伪像的已知尺寸作为输出来产生输出。 可以将输出与第二物理伪像的测量尺寸进行比较以产生结果。 可以根据结果为计算机模拟分配品质因数。 光掩模可以具有一个或多个具有一个或多个可追溯测量尺寸的特征。