公开(公告)号：US20240085801A1

公开(公告)日：2024-03-14

申请号：US17993731

申请日：2022-11-23

申请人： Wuhan Yuwei Optical Software Co., Ltd.

发明人： Haiqing Wei ,  Xianhua Ke

IPC分类号： G03F7/20

CPC分类号： G03F7/70516

摘要： Light source calibration methods and systems employed in source mask optimization are provided. The method includes: initializing a light source pattern and a mask pattern; using an SMO algorithm to iteratively optimize the light source pattern and the mask pattern; using a pre-established light source error correction model to correct the light source pattern after each iterative optimization, and updating the light source pattern after each iterative optimization with a corrected light source pattern in a current iteration process. The light source error correction model is established according to an input and output data set consisting of an input target light source pattern and an output actual light source pattern of a PIS. The method includes determining, according to an evaluation criterion or a condition of convergence of iteration of the SMO algorithm, whether the optimization meets a requirement.

公开(公告)号：US20230341784A1

公开(公告)日：2023-10-26

申请号：US18016811

申请日：2021-07-14

申请人： ASML NETHERLANDS B.V.

发明人： Tijmen Pieter COLLIGNON ,  Pavel SMAL ,  Cyrus Emil TABERY ,  Thiago DOS SANTOS GUZELLA ,  Vahid BASTANI

IPC分类号： G03F7/00 ,  G03F9/00

CPC分类号： G03F7/70508 ,  G03F9/7034 ,  G03F9/7026 ,  G03F7/70908 ,  G03F7/70516

摘要： Methods and associated apparatus for identifying contamination in a semiconductor fab. The methods include determining contamination map data for a plurality of semiconductor wafers clamped to a wafer table after being processed in the semiconductor fab. Combined contamination map data is determined based, at least in part, on a combination of the contamination map data of the plurality of semiconductor wafers. The combined contamination map data is combined to reference data. The reference data include one or more values for the combined contamination map data that are indicative of contamination in one or more tools in the semiconductor fab.

公开(公告)号：US11698251B2

公开(公告)日：2023-07-11

申请号：US17137840

申请日：2020-12-30

申请人： KLA Corporation

发明人： Andrei V. Shchegrov ,  Nadav Gutman ,  Alexander Kuznetsov ,  Antonio Arion Gellineau

IPC分类号： G01B15/00 ,  G03F7/00 ,  H01L21/66 ,  G01B15/02 ,  H01L21/027 ,  H10B10/00

CPC分类号： G01B15/00 ,  G01B15/02 ,  G03F7/70516 ,  G03F7/70633 ,  H01L22/12 ,  H01L22/20 ,  G01B2210/56 ,  H01L21/0276 ,  H10B10/12

摘要： Methods and systems for performing overlay and edge placement errors based on Soft X-Ray (SXR) scatterometry measurement data are presented herein. Short wavelength SXR radiation focused over a small illumination spot size enables measurement of design rule targets or in-die active device structures. In some embodiments, SXR scatterometry measurements are performed with SXR radiation having energy in a range from 10 to 5,000 electronvolts. As a result, measurements at SXR wavelengths permit target design at process design rules that closely represents actual device overlay. In some embodiments, SXR scatterometry measurements of overlay and shape parameters are performed simultaneously from the same metrology target to enable accurate measurement of Edge Placement Errors. In another aspect, overlay of aperiodic device structures is estimated based on SXR measurements of design rule targets by calibrating the SXR measurements to reference measurements of the actual device target.

公开(公告)号：US20180224755A1

公开(公告)日：2018-08-09

申请号：US15949057

申请日：2018-04-09

申请人： ASML Netherland B.V.

发明人： Hans BUTLER

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70825 ,  G03F7/7085 ,  G03F9/7019

摘要： A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.

公开(公告)号：US20180203367A1

公开(公告)日：2018-07-19

申请号：US15834763

申请日：2017-12-07

申请人： ASML Netherlands B.V.

发明人： Martin Jacobus Johan JAK

IPC分类号： G03F7/20

CPC分类号： G03F7/70516 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70483 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7088

摘要： An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of the overlay measurement may be degraded. A method of predicting GI sensitivity is performed using first and second images (45+, 45−) of the target structure using opposite diffraction orders. Regions (ROI) of the same images are used to measure overlay. Multiple local measurements of symmetry (S) and asymmetry (A) of intensity between the opposite diffraction orders are made, each local measurement of symmetry and asymmetry corresponding to a particular location on the target structure. Based on a statistical analysis of the local measurements of symmetry and asymmetry values, a prediction of sensitivity to grating imbalance is obtained. This can be used to select better measurement recipes, and/or to correct errors caused by grating imbalance.

公开(公告)号：US20180149522A1

公开(公告)日：2018-05-31

申请号：US15362033

申请日：2016-11-28

申请人： Cymer, LLC

发明人： Zhongquan Zhao

IPC分类号： G01J3/50 ,  G01N21/31 ,  G01N21/33 ,  G03F7/20

CPC分类号： G03F7/70575 ,  G01J3/0205 ,  G01J3/027 ,  G01J3/26 ,  G01J3/28 ,  G01J2003/2866 ,  G01J2003/2879 ,  G01N21/3103 ,  G01N21/33 ,  G03F7/70516 ,  G03F7/7085 ,  H01S5/0687

摘要： An apparatus includes a material having an optical transition profile with a known energy transition; and a detector configured to detect a characteristic associated with the interaction between the material and the testing light beam. The testing light beam is either a primary light beam produced by an optical source or a calibration light beam. The apparatus also includes a spectral analysis module placed in a path of the primary light beam; and a control system connected to the detector and to the spectral detection system. The control system is configured to determine a reference spectral profile of the primary light beam based on the detected characteristic; compare the reference spectral profile of the primary light beam with a sensed spectral profile of the primary light beam output from the spectral detection system; and based on this comparison, adjust a scale of the spectral detection system.

公开(公告)号：US09983060B1

公开(公告)日：2018-05-29

申请号：US15362033

申请日：2016-11-28

申请人： Cymer, LLC

发明人： Zhongquan Zhao

IPC分类号： G01D18/00 ,  G01J3/50 ,  G01N21/31 ,  G01N21/33 ,  G03F7/20

CPC分类号： G03F7/70575 ,  G01J3/0205 ,  G01J3/027 ,  G01J3/26 ,  G01J3/28 ,  G01J2003/2866 ,  G01J2003/2879 ,  G01N21/3103 ,  G01N21/33 ,  G03F7/70516 ,  G03F7/7085 ,  H01S5/0687

摘要： An apparatus includes a material having an optical transition profile with a known energy transition; and a detector configured to detect a characteristic associated with the interaction between the material and the testing light beam. The testing light beam is either a primary light beam produced by an optical source or a calibration light beam. The apparatus also includes a spectral analysis module placed in a path of the primary light beam; and a control system connected to the detector and to the spectral detection system. The control system is configured to determine a reference spectral profile of the primary light beam based on the detected characteristic; compare the reference spectral profile of the primary light beam with a sensed spectral profile of the primary light beam output from the spectral detection system; and based on this comparison, adjust a scale of the spectral detection system.

公开(公告)号：US20180006425A1

公开(公告)日：2018-01-04

申请号：US15700754

申请日：2017-09-11

申请人： Cymer, LLC ,  ASML NETHERLANDS B.V.

发明人： Joshua Jon Thornes ,  Tanuj Aggarwal ,  Kevin Michael O'Brien ,  Frank Everts ,  Herman Philip Godfried ,  Russell Allen Burdt

IPC分类号： H01S3/13 ,  H01S3/097 ,  G03F7/20 ,  H01S3/038 ,  H01S3/23 ,  H01S3/036 ,  H01S3/225

CPC分类号： H01S3/1305 ,  G01J1/0228 ,  G01J1/4257 ,  G03F7/70041 ,  G03F7/70516 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/09702 ,  H01S3/1055 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2308 ,  H01S3/2333

摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.

公开(公告)号：US20170336723A1

公开(公告)日：2017-11-23

申请号：US15661295

申请日：2017-07-27

申请人： NIKON CORPORATION

发明人： Yuichi SHIBAZAKI

IPC分类号： G03F7/20 ,  G01D5/26 ,  G01B11/27 ,  G01D18/00

CPC分类号： G03F7/70725 ,  G01B11/27 ,  G01D5/26 ,  G01D5/266 ,  G01D18/002 ,  G03F7/70141 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70516 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70975 ,  Y10T29/49826

摘要： Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the encoder is performed. Accordingly, by using measurement values of the interferometer, correction information for correcting the measurement values of the encoder whose short-term stability of the measurement values excels the interferometer is obtained. Then, based on the measurement values of the encoder and the correction information, the movable body is driven in the Y-axis direction with good precision.

公开(公告)号：US09470988B2

公开(公告)日：2016-10-18

申请号：US14437441

申请日：2013-10-17

申请人： ASML Netherlands B.V.

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC分类号： G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

摘要： A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

摘要翻译： 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。