Optical metrology target design for simultaneous measurement of multiple periodic structures
    1.
    发明申请
    Optical metrology target design for simultaneous measurement of multiple periodic structures 审中-公开
    用于同时测量多个周期性结构的光学计量目标设计

    公开(公告)号:US20050173634A1

    公开(公告)日:2005-08-11

    申请号:US11071800

    申请日:2005-03-02

    IPC分类号: G02B27/46 G01N23/00

    摘要: An optical metrology target is provided and has a first periodic structure and a second periodic structure. The first periodic structure has at least two features and a first pitch, and the second periodic structure has at least two features and a second pitch. The optical metrology target is illuminated with a light source, and an optical signal from the optical metrology target is received and analyzed.

    摘要翻译: 提供光学测量目标并具有第一周期性结构和第二周期性结构。 第一周期结构具有至少两个特征和第一间距,并且第二周期结构具有至少两个特征和第二间距。 用光源照射光学测量目标,并且接收并分析来自光学计量学目标的光学信号。