Selective plating process
    1.
    发明授权
    Selective plating process 失效
    选择电镀工艺

    公开(公告)号:US4199415A

    公开(公告)日:1980-04-22

    申请号:US24583

    申请日:1979-03-28

    IPC分类号: C25D5/02 H05K3/24

    CPC分类号: C25D5/022 H05K3/243

    摘要: A method of selective plating, e.g. of gold on phosphor bronze, includes the steps of printing on the phosphor-bronze a mask which defines the area to be plated, electro-painting the unmasked areas in an electrolytic bath with an epoxy-phenolic paint, stoving the material so that the epoxy coat becomes a strongly adherent and chemically resistant layer, removing the mask produced in the first step in a suitable solvent, leaving the metal to be plated bare, and electro-plating. The epoxy coating may be left in situ or removed.

    摘要翻译: 选择性电镀的方法,例如 在磷青铜上的金包括以下步骤:在磷青铜上印刷限定待镀区域的面罩,用环氧酚醛漆在电解槽中电镀未掩蔽区域,烘烤材料,使环氧树脂 涂层成为强粘附和耐化学腐蚀的层,将合适的溶剂中的第一步产生的掩模除去,使待镀金属裸露和电镀。 环氧涂层可以留在原位或去除。