Alternative methodology for defect simulation and system
    1.
    发明授权
    Alternative methodology for defect simulation and system 有权
    缺陷模拟和系统的替代方法

    公开(公告)号:US07356787B2

    公开(公告)日:2008-04-08

    申请号:US11099834

    申请日:2005-04-06

    CPC classification number: G06F17/5081

    Abstract: A system for defect simulation is provided. A defect layout generator generates a defect layout comprising a given number of spot defects of a given size. A processor first compares the defect layout and a provided circuit layout comprising a plurality of conductive regions. The processor further determines whether the spot defects are located on the conductive regions, and determines whether short-circuits and/or open circuits are caused by the spot defects in the conductive regions.

    Abstract translation: 提供了一种用于缺陷模拟的系统。 缺陷布局生成器生成包括给定尺寸的给定数量的斑点缺陷的缺陷布局。 处理器首先比较缺陷布局和提供的包括多个导电区域的电路布局。 处理器还确定斑点缺陷是否位于导电区域上,并且确定短路和/或开路是否由导电区域中的斑点缺陷引起。

    Alternative methodology for defect simulation and system
    2.
    发明申请
    Alternative methodology for defect simulation and system 有权
    缺陷模拟和系统的替代方法

    公开(公告)号:US20060230371A1

    公开(公告)日:2006-10-12

    申请号:US11099834

    申请日:2005-04-06

    CPC classification number: G06F17/5081

    Abstract: A system for defect simulation is provided. A defect layout generator generates a defect layout comprising a given number of spot defects of a given size. A processor first compares the defect layout and a provided circuit layout comprising a plurality of conductive regions. The processor further determines whether the spot defects are located on the conductive regions, and determines whether short-circuits and/or open circuits are caused by the spot defects in the conductive regions.

    Abstract translation: 提供了一种用于缺陷模拟的系统。 缺陷布局生成器生成包括给定尺寸的给定数量的斑点缺陷的缺陷布局。 处理器首先比较缺陷布局和提供的包括多个导电区域的电路布局。 处理器还确定斑点缺陷是否位于导电区域上,并且确定短路和/或开路是否由导电区域中的斑点缺陷引起。

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