公开(公告)号：US09120674B2

公开(公告)日：2015-09-01

申请号：US13546356

申请日：2012-07-11

申请人： Hanns Wochner ,  Thomas Gailer ,  Rudolf Kellner

发明人： Hanns Wochner ,  Thomas Gailer ,  Rudolf Kellner

IPC分类号： B08B3/08 ,  C01B33/037 ,  G05D9/00

CPC分类号： C01B33/037 ,  B08B3/08 ,  G05D9/00

摘要： Disclosed is a process for cleaning polycrystalline silicon chunks in an acidic cleaning bath, wherein: (a) the cleaning includes several cleaning cycles, (b) a particular amount of acid is consumed in each cycle, (c) a computer-controlled dosage system integrator adds up those amounts of acid consumed in each cycle to give a current total consumption of acid in the bath, and (d) on attainment of a total consumption of acid in the bath corresponding to an optimal dosage of the dosage system, the dosage system supplies this optimal dosage of unconsumed acid withdrawn from a reservoir vessel to the bath. Another process for cleaning polycrystalline silicon chunks in an acidic cleaning bath includes an acid circuit in which acid is circulated, wherein the ratio of amount of acid circulated in liters to the mass of polysilicon chunks present in the bath in kg is greater than 10.

摘要翻译： 公开了一种在酸性清洗浴中清洗多晶硅块的方法，其中：（a）清洁包括若干清洁循环，（b）在每个循环中消耗特定量的酸，（c）计算机控制的剂量系统 积分器将每个循环中消耗的酸的量相加，以给出浴中酸的当前总消耗量，以及（d）达到对应于剂量系统的最佳剂量的浴中的总酸消耗量，剂量 系统将从储存容器中取出的未消耗的酸的最佳剂量提供给浴。 用于在酸性清洗浴中清洗多晶硅块的另一种方法包括其中酸循环的酸性回路，其中以kg计循环的酸的量与浴中存在的多晶硅块的质量比以kg计大于10。

公开(公告)号：US20130025625A1

公开(公告)日：2013-01-31

申请号：US13546356

申请日：2012-07-11

申请人： Hanns WOCHNER ,  Thomas GAILER ,  Rudolf KELLNER

发明人： Hanns WOCHNER ,  Thomas GAILER ,  Rudolf KELLNER

IPC分类号： B08B3/08 ,  C11D7/02

CPC分类号： C01B33/037 ,  B08B3/08 ,  G05D9/00

摘要： Disclosed is a process for cleaning polycrystalline silicon chunks in an acidic cleaning bath, wherein: (a) the cleaning includes several cleaning cycles, (b) a particular amount of acid is consumed in each cycle, (c) a computer-controlled dosage system integrator adds up those amounts of acid consumed in each cycle to give a current total consumption of acid in the bath, and (d) on attainment of a total consumption of acid in the bath corresponding to an optimal dosage of the dosage system, the dosage system supplies this optimal dosage of unconsumed acid withdrawn from a reservoir vessel to the bath. Another process for cleaning polycrystalline silicon chunks in an acidic cleaning bath includes an acid circuit in which acid is circulated, wherein the ratio of amount of acid circulated in liters to the mass of polysilicon chunks present in the bath in kg is greater than 10.

摘要翻译： 公开了一种在酸性清洗浴中清洗多晶硅块的方法，其中：（a）清洁包括若干清洁循环，（b）在每个循环中消耗特定量的酸，（c）计算机控制的剂量系统 积分器将每个循环中消耗的酸的量相加，以给出浴中酸的当前总消耗量，以及（d）达到对应于剂量系统的最佳剂量的浴中的总酸消耗量，剂量 系统将从储存容器中取出的未消耗的酸的最佳剂量提供给浴。 用于在酸性清洗浴中清洗多晶硅块的另一种方法包括其中酸循环的酸性回路，其中以kg计循环的酸的量与浴中存在的多晶硅块的质量比以kg计大于10。