公开(公告)号：US4960607A

公开(公告)日：1990-10-02

申请号：US335345

申请日：1989-04-10

申请人： Manfred Neuman ,  Gerhard ZeiBig ,  Karl-Heinz Ihle ,  Eckehard Madler ,  Siegfried Schiller ,  Rudolf Schroller

发明人： Manfred Neuman ,  Gerhard ZeiBig ,  Karl-Heinz Ihle ,  Eckehard Madler ,  Siegfried Schiller ,  Rudolf Schroller

IPC分类号： C23C14/30 ,  C23C14/54 ,  H01G13/06

CPC分类号： H01G13/06 ,  C23C14/30 ,  C23C14/547

摘要： In a method for coating strip material by means of an electron beam line evaporator, deflecting in a time-invariant program the electron beam to a plurality of dwell points arranged along a path normal to the direction of strip travel, sensing film thickness in a time-variant programmed mode at a plurality of positions arranged along a course normal to said direction of strip travel and subsequent to said path in said direction of strip travel, controlling in accordance with said programmed mode the dwell of said electron beam at selected dwell points to provide uniform film thickness distribution on said strip.

摘要翻译： 在通过电子束线蒸发器涂覆条带材料的方法中，将时间不变的程序中的电子束偏转到沿着垂直于条带行进方向的路径布置的多个停留点，在一段时间内感测膜厚度 在沿着条带行进方向垂直的路线布置的多个位置处，并且在所述条带行进方向上的所述路径之后，根据所述编程模式控制所选择的驻留点处的所述电子束的停留位置 在所述条上提供均匀的膜厚度分布。