公开(公告)号：US4960607A

公开(公告)日：1990-10-02

申请号：US335345

申请日：1989-04-10

申请人： Manfred Neuman ,  Gerhard ZeiBig ,  Karl-Heinz Ihle ,  Eckehard Madler ,  Siegfried Schiller ,  Rudolf Schroller

发明人： Manfred Neuman ,  Gerhard ZeiBig ,  Karl-Heinz Ihle ,  Eckehard Madler ,  Siegfried Schiller ,  Rudolf Schroller

IPC分类号： C23C14/30 ,  C23C14/54 ,  H01G13/06

CPC分类号： H01G13/06 ,  C23C14/30 ,  C23C14/547

摘要： In a method for coating strip material by means of an electron beam line evaporator, deflecting in a time-invariant program the electron beam to a plurality of dwell points arranged along a path normal to the direction of strip travel, sensing film thickness in a time-variant programmed mode at a plurality of positions arranged along a course normal to said direction of strip travel and subsequent to said path in said direction of strip travel, controlling in accordance with said programmed mode the dwell of said electron beam at selected dwell points to provide uniform film thickness distribution on said strip.

摘要翻译： 在通过电子束线蒸发器涂覆条带材料的方法中，将时间不变的程序中的电子束偏转到沿着垂直于条带行进方向的路径布置的多个停留点，在一段时间内感测膜厚度 在沿着条带行进方向垂直的路线布置的多个位置处，并且在所述条带行进方向上的所述路径之后，根据所述编程模式控制所选择的驻留点处的所述电子束的停留位置 在所述条上提供均匀的膜厚度分布。

公开(公告)号：US4524717A

公开(公告)日：1985-06-25

申请号：US485650

申请日：1983-04-18

申请人： Manfred Neumann ,  Siegfried Schiller ,  Gerhard ZeiBig ,  Henry Morgner ,  Gunter Jasch

发明人： Manfred Neumann ,  Siegfried Schiller ,  Gerhard ZeiBig ,  Henry Morgner ,  Gunter Jasch

IPC分类号： C23C14/30 ,  H01J37/305 ,  C23C13/10

CPC分类号： C23C14/30 ,  H01J37/3053

摘要： The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.

摘要翻译： 本发明是用于温度敏感的宽条或类似基底的涂布装置。 为了获得高质量的涂层，必须使通过蒸汽云的电子束（EB）的路径最小化，并且避免反向散射的电子从蒸发材料中排出。 根据本发明，通过在与EB喷枪连接的偏转系统上组装具有垂直场方向的扇区场来解决该问题，随后是具有水平场方向的偏转场。 发散电子束通过场的几何形状被引导到蒸发材料。