公开(公告)号：US06714572B2

公开(公告)日：2004-03-30

申请号：US09728931

申请日：2000-12-01

申请人： Larry A. Coldren ,  Ryan L. Naone

发明人： Larry A. Coldren ,  Ryan L. Naone

IPC分类号： H01S500

CPC分类号： H01S5/18316 ,  H01S5/2068 ,  H01S5/3054

摘要： A process for forming a Vertical Cavity Laser (VCL) structure that includes using an intermixing technique involving an high temperature annealing operation to overcome lateral carrier diffusion away from the center of the active region of the VCL. Degrading effects of the high temperature annealing are avoided by first restricting the dopant associated with the p-type Bragg reflector (DBR) region of the VCL to low diffusivity types such as carbon, thus eliminating a thermally-induced diffusion that occurs when other p-type dopants such as beryllium (Be), Zinc (Zn), or Magnesium (Mg) are employed. Further, the oxide created to act as an aperture in a conventional VCL structure is removed leaving behind an air gap having the shape of the oxide aperture. It was found that the degrading effects associated with annealing the VCL structure were minimized using carbon as the p-type dopant and air gap apertures. In addition, it was determined that the annealed, air gap apertured, VCL provided the same optical loss properties previously attributed only to an un-annealed, oxide-apertured, VCL—but without sacrificing efficiency due to lateral carrier diffusion.

摘要翻译： 一种用于形成垂直腔激光（VCL）结构的方法，其包括使用涉及高温退火操作的混合技术来克服远离VCL的有源区域的中心的横向载流子扩散。 通过首先将与VCL的p型布拉格反射器（DBR）区域相关联的掺杂剂限制为诸如碳的低扩散性类型来避免高温退火的降解效应，从而消除当其它p- 使用铍（Be），锌（Zn）或镁（Mg）等掺杂剂。 此外，除去留在具有氧化物孔径形状的气隙之后，形成用作常规VCL结构中的孔的氧化物。 已经发现，使用碳作为p型掺杂剂和气隙孔，使VCL结构退火相关的降解效应被最小化。 此外，确定退火气隙孔径VCL提供了先前归因于未退火的氧化物开孔的VCL的相同的光学损耗特性，但不会由于侧向载流子扩散而牺牲效率。