公开(公告)号：US07858527B2

公开(公告)日：2010-12-28

申请号：US11861490

申请日：2007-09-26

Applicant: Nam-Soo Kim ,  Sang-Mun Chon ,  Young-Sam Lim ,  Kyoung-Moon Kang ,  Sei-Cheol Lee ,  Jae-Hyun So ,  Dong-Jun Lee

Inventor： Nam-Soo Kim ,  Sang-Mun Chon ,  Young-Sam Lim ,  Kyoung-Moon Kang ,  Sei-Cheol Lee ,  Jae-Hyun So ,  Dong-Jun Lee

IPC: H01L21/302 ,  H01L21/461

CPC classification number: H01L21/31053 ,  C08L101/02 ,  C09G1/02

Abstract: An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.

Abstract translation: 用于浆料的添加剂组合物包含聚合酸的第一盐，其包含具有第一重均分子量和第一基础材料的第一聚合酸和包含第二聚合酸的第二盐，所述第二聚合酸具有第二重均分子量 和第二基材。 通过混合添加剂组合物，抛光颗粒组合物和水来制备浆料组合物。 当使用浆料组合物进行化学机械抛光时，实现了良好的抛光选择性。

公开(公告)号：US07288212B2

公开(公告)日：2007-10-30

申请号：US10293918

申请日：2002-11-14

Applicant: Nam-Soo Kim ,  Sang-Mun Chon ,  Young-Sam Lim ,  Kyoung-Moon Kang ,  Sei-Cheol Lee ,  Jae-Hyun So ,  Dong-Jun Lee

Inventor： Nam-Soo Kim ,  Sang-Mun Chon ,  Young-Sam Lim ,  Kyoung-Moon Kang ,  Sei-Cheol Lee ,  Jae-Hyun So ,  Dong-Jun Lee

IPC: C09K13/00 ,  C09K13/04 ,  H01L21/302

CPC classification number: H01L21/31053 ,  C08L101/02 ,  C09G1/02

Abstract: An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.

Abstract translation: 用于浆料的添加剂组合物包含聚合酸的第一盐，其包含具有第一重均分子量和第一基础材料的第一聚合酸和包含第二聚合酸的第二盐，所述第二聚合酸具有第二重均分子量 和第二基材。 通过混合添加剂组合物，抛光颗粒组合物和水来制备浆料组合物。 当使用浆料组合物进行化学机械抛光时，实现了良好的抛光选择性。

公开(公告)号：US20080014838A1

公开(公告)日：2008-01-17

申请号：US11861490

申请日：2007-09-26

Applicant: Nam-Soo KIM ,  Sang-Mun CHON ,  Young-Sam LIM ,  Kyoung-Moon KANG ,  Sei-Cheol LEE ,  Jae-Hyun SO ,  Dong-Jun LEE

Inventor： Nam-Soo KIM ,  Sang-Mun CHON ,  Young-Sam LIM ,  Kyoung-Moon KANG ,  Sei-Cheol LEE ,  Jae-Hyun SO ,  Dong-Jun LEE

IPC: B24B1/00

CPC classification number: H01L21/31053 ,  C08L101/02 ,  C09G1/02

Abstract: An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.

Abstract translation: 用于浆料的添加剂组合物包含聚合酸的第一盐，其包含具有第一重均分子量和第一基础材料的第一聚合酸和包含第二聚合酸的第二盐，所述第二聚合酸具有第二重均分子量 和第二基材。 通过混合添加剂组合物，抛光颗粒组合物和水来制备浆料组合物。 当使用浆料组合物进行化学机械抛光时，实现了良好的抛光选择性。