公开(公告)号：US08627836B2

公开(公告)日：2014-01-14

申请号：US11945658

申请日：2007-11-27

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/12 ,  B08B6/00

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

摘要翻译： 描述了一种清洁光掩模掩模版的防护薄膜框架和粘合环的系统和方法。 一个实施例包括将光掩模与防护薄膜组件框架隔离的盖。 掩模版固定在旋转卡盘和盖子之间，使得光掩模被隔离并保护不受清洁过程中使用的溶剂的影响。 当光罩固定在旋转卡盘上时，旋转卡盘在加压的溶剂喷雾下旋转。 对光掩模腐蚀的溶剂从粘合环中除去污染物。 在暴露的区域被清洁之后，除去盖子并且使用较少侵入性的溶剂和方法除去来自光掩模的异物。

公开(公告)号：US20120237703A1

公开(公告)日：2012-09-20

申请号：US11945658

申请日：2007-11-27

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B32B1/02 ,  B32B1/04 ,  B32B3/24 ,  B32B3/00 ,  B32B3/30

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

摘要翻译： 描述了一种清洁光掩模掩模版的防护薄膜框架和粘合环的系统和方法。 一个实施例包括将光掩模与防护薄膜组件框架隔离的盖。 掩模版固定在旋转卡盘和盖子之间，使得光掩模被隔离并保护不受清洁过程中使用的溶剂的影响。 当光罩固定在旋转卡盘上时，旋转卡盘在加压的溶剂喷雾下旋转。 对光掩模腐蚀的溶剂从粘合环中除去污染物。 在暴露的区域被清洁之后，除去盖子并且使用较少侵入性的溶剂和方法除去来自光掩模的异物。

公开(公告)号：US07008487B1

公开(公告)日：2006-03-07

申请号：US10090986

申请日：2002-03-04

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/02

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

摘要翻译： 描述了一种清洁光掩模掩模版的防护薄膜框架和粘合环的系统和方法。 一个实施例包括将光掩模与防护薄膜组件框架隔离的盖。 掩模版固定在旋转卡盘和盖子之间，使得光掩模被隔离并保护不受清洁过程中使用的溶剂的影响。 当光罩固定在旋转卡盘上时，旋转卡盘在加压的溶剂喷雾下旋转。 对光掩模腐蚀的溶剂从粘合环中除去污染物。 在暴露的区域被清洁之后，除去盖子并且使用较少侵入性的溶剂和方法除去来自光掩模的异物。

公开(公告)号：US07300526B2

公开(公告)日：2007-11-27

申请号：US11368895

申请日：2006-03-06

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/02

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

摘要翻译： 描述了一种清洁光掩模掩模版的防护薄膜框架和粘合环的系统和方法。 一个实施例包括将光掩模与防护薄膜组件框架隔离的盖。 掩模版固定在旋转卡盘和盖子之间，使得光掩模被隔离并保护不受清洁过程中使用的溶剂的影响。 当光罩固定在旋转卡盘上时，旋转卡盘在加压的溶剂喷雾下旋转。 对光掩模腐蚀的溶剂从粘合环中除去污染物。 在暴露的区域被清洁之后，除去盖子并且使用较少侵入性的溶剂和方法除去来自光掩模的异物。

公开(公告)号：US20060144425A1

公开(公告)日：2006-07-06

申请号：US11368895

申请日：2006-03-06

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/00

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.