Substrate treatment apparatus
    1.
    发明授权
    Substrate treatment apparatus 有权
    基板处理装置

    公开(公告)号:US08882961B2

    公开(公告)日:2014-11-11

    申请号:US13127571

    申请日:2009-11-06

    摘要: The density of a treatment fluid in exhaust gas is reduced, the amount of the treatment fluid that flows into exhausting equipment connected to a substrate treatment apparatus is reduced, and a load on the exhausting equipment is reduced. A substrate treatment apparatus includes: a substrate treating unit that treats a substrate; a treatment fluid supply unit that supplies, to the substrate treating unit, a treatment fluid used to treat the substrate; and an exhaust gas treating unit into which an exhaust gas containing the treatment fluid discharged from the substrate treating unit is introduced. The exhaust gas treating unit includes spray nozzles that spray a solvent toward the exhaust gas, the solvent dissolving the treatment fluid, thereby reducing the density of the treatment fluid in the exhaust gas. The exhaust gas treating unit has porous dispersion plates that cause the exhaust gas to disperse.

    摘要翻译: 排气中的处理液的密度降低,流入与基板处理装置连接的排气装置中的处理流体的量减少,排气装置的负荷减小。 基板处理装置包括:基板处理单元,其处理基板; 处理液供给单元,向所述基板处理单元供给用于处理所述基板的处理流体; 以及废气处理单元,其中引入含有从基板处理单元排出的处理流体的废气。 排气处理单元包括向溶剂排出溶剂的喷嘴,溶解处理流体的溶剂,从而降低排气中的处理流体的密度。 排气处理单元具有使废气分散的多孔分散板。

    SUBSTRATE TREATMENT APPARATUS
    2.
    发明申请
    SUBSTRATE TREATMENT APPARATUS 有权
    基板处理设备

    公开(公告)号:US20110259521A1

    公开(公告)日:2011-10-27

    申请号:US13127571

    申请日:2009-11-06

    IPC分类号: C23F1/08

    摘要: The density of a treatment fluid in exhaust gas is reduced, the amount of the treatment fluid that flows into exhausting equipment connected to a substrate treatment apparatus is reduced, and a load on the exhausting equipment is reduced. A substrate treatment apparatus includes: a substrate treating unit that treats a substrate; a treatment fluid supply unit that supplies, to the substrate treating unit, a treatment fluid used to treat the substrate; and an exhaust gas treating unit into which an exhaust gas containing the treatment fluid discharged from the substrate treating unit is introduced. The exhaust gas treating unit includes spray nozzles that spray a solvent toward the exhaust gas, the solvent dissolving the treatment fluid, thereby reducing the density of the treatment fluid in the exhaust gas. The exhaust gas treating unit has porous dispersion plates that cause the exhaust gas to disperse.

    摘要翻译: 排气中的处理液的密度降低,流入与基板处理装置连接的排气装置中的处理流体的量减少,排气装置的负荷减小。 基板处理装置包括:基板处理单元,其处理基板; 处理液供给单元,向所述基板处理单元供给用于处理所述基板的处理流体; 以及废气处理单元,其中引入含有从基板处理单元排出的处理流体的废气。 排气处理单元包括向溶剂排出溶剂的喷嘴,溶解处理流体的溶剂,从而降低排气中的处理流体的密度。 排气处理单元具有使废气分散的多孔分散板。