公开(公告)号：US08151219B2

公开(公告)日：2012-04-03

申请号：US12955895

申请日：2010-11-29

申请人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

发明人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from the error marked region to extract a pattern for decomposition analysis. Some embodiments compare the extracted pattern to known patterns stored in a library, which also stores at least one previously computed decomposition solution for each known pattern. For an extracted pattern existing within the library, some embodiments retrieve the previously computed decomposition solution from the library. For an extracted pattern that does not exist within the library, some embodiments use one or more simulations to determine a decomposition solution for the extracted pattern. The resulting decomposition solution replaces the extracted pattern within the design layout producing a variant of the original layout that contains the decomposed solution for the pattern.

摘要翻译： 一些实施例提供了用于识别不符合制造约束的设计布局内的图案的误差标记的方法和系统。 一些实施例将区域从错误标记区域扩展以提取用于分解分析的模式。 一些实施例将提取的图案与存储在库中的已知图案进行比较，库中还存储了每个已知图案的至少一个先前计算的分解解。 对于库中存在的提取模式，一些实施例从库中检索先前计算的分解解。 对于在库内不存在的提取模式，一些实施例使用一个或多个模拟来确定所提取模式的分解解。 所得到的分解解代替了设计布局中提取的图案，从而产生了原始布局的变体，该变体包含该模式的分解解。

公开(公告)号：US20110167397A1

公开(公告)日：2011-07-07

申请号：US12955895

申请日：2010-11-29

申请人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

发明人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

IPC分类号： G06F17/50 ,  G06F9/455

CPC分类号： G06F17/5068

摘要： Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from the error marked region to extract a pattern for decomposition analysis. Some embodiments compare the extracted pattern to known patterns stored in a library, which also stores at least one previously computed decomposition solution for each known pattern. For an extracted pattern existing within the library, some embodiments retrieve the previously computed decomposition solution from the library. For an extracted pattern that does not exist within the library, some embodiments use one or more simulations to determine a decomposition solution for the extracted pattern. The resulting decomposition solution replaces the extracted pattern within the design layout producing a variant of the original layout that contains the decomposed solution for the pattern.

摘要翻译： 一些实施例提供了用于识别不符合制造约束的设计布局内的图案的误差标记的方法和系统。 一些实施例将区域从错误标记区域扩展以提取用于分解分析的模式。 一些实施例将提取的图案与存储在库中的已知图案进行比较，库中还存储了每个已知图案的至少一个先前计算的分解解。 对于库中存在的提取模式，一些实施例从库中检索先前计算的分解解。 对于在库内不存在的提取模式，一些实施例使用一个或多个模拟来确定所提取模式的分解解。 所得到的分解解代替了设计布局中提取的图案，从而产生了原始布局的变体，该变体包含该模式的分解解。

公开(公告)号：US20090199137A1

公开(公告)日：2009-08-06

申请号：US12023512

申请日：2008-01-31

申请人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

发明人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

IPC分类号： G06F17/50 ,  G03F7/20

CPC分类号： G06F17/5068

摘要： Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from the error marked region to extract a pattern for decomposition analysis. Some embodiments compare the extracted pattern to known patterns stored in a library, which also stores at least one previously computed decomposition solution for each known pattern. For an extracted pattern existing within the library, some embodiments retrieve the previously computed decomposition solution from the library. For an extracted pattern that does not exist within the library, some embodiments use one or more simulations to determine a decomposition solution for the extracted pattern. The resulting decomposition solution replaces the extracted pattern within the design layout producing a variant of the original layout that contains the decomposed solution for the pattern.

摘要翻译： 一些实施例提供了用于识别不符合制造约束的设计布局内的图案的误差标记的方法和系统。 一些实施例将区域从错误标记区域扩展以提取用于分解分析的模式。 一些实施例将提取的图案与存储在库中的已知图案进行比较，库中还存储了每个已知图案的至少一个先前计算的分解解。 对于库中存在的提取模式，一些实施例从库中检索先前计算的分解解。 对于在库内不存在的提取模式，一些实施例使用一个或多个模拟来确定所提取模式的分解解。 所得到的分解解代替了设计布局中提取的图案，从而产生了原始布局的变体，该变体包含该模式的分解解。

公开(公告)号：US07861196B2

公开(公告)日：2010-12-28

申请号：US12023512

申请日：2008-01-31

申请人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

发明人： Judy Huckabay ,  Weiping Fang ,  Chung-Shin Kang ,  Shiying Zhou

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from the error marked region to extract a pattern for decomposition analysis. Some embodiments compare the extracted pattern to known patterns stored in a library, which also stores at least one previously computed decomposition solution for each known pattern. For an extracted pattern existing within the library, some embodiments retrieve the previously computed decomposition solution from the library. For an extracted pattern that does not exist within the library, some embodiments use one or more simulations to determine a decomposition solution for the extracted pattern. The resulting decomposition solution replaces the extracted pattern within the design layout producing a variant of the original layout that contains the decomposed solution for the pattern.

摘要翻译： 一些实施例提供了用于识别不符合制造约束的设计布局内的图案的误差标记的方法和系统。 一些实施例将区域从错误标记区域扩展以提取用于分解分析的模式。 一些实施例将提取的图案与存储在库中的已知图案进行比较，库中还存储了每个已知图案的至少一个先前计算的分解解。 对于库中存在的提取模式，一些实施例从库中检索先前计算的分解解。 对于在库内不存在的提取模式，一些实施例使用一个或多个模拟来确定所提取模式的分解解。 所得到的分解解代替了设计布局中提取的图案，从而产生了原始布局的变体，该变体包含该模式的分解解。